Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTB4R | Q15722 | 1/20 | 0.32 |
| ▸ | LTB4R2 | Q9NPC1 | 1/20 | 0.32 |
| ▸ | PSMB1 | P20618 | 1/20 | 0.31 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.31 |
| ▸ | PSMB2 | P49721 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 2/20 | 0.31 |
| ▸ | TP53 | P04637 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | AR | P10275 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15869162 | 0.91 | PSMB1 (0.36) | PSMB1PSMB5PSMB2HIF1AHTT | |
| SCHEMBL196326 | 0.87 | LMNA (0.39) | PSMB1PSMB5PSMB2HIF1AHTT | |
| SCHEMBL1456662 | 0.87 | LMNA (0.39) | MAPTKMT2AALDH1A1 | |
| SCHEMBL13717573 | 0.80 | ESR1 (0.50) | HIF1AHTTHPGDTSHRMEN1 | |
| SCHEMBL4060025 | 0.77 | NR1H4 (0.42) | TP53MAPTHPGDTSHRMEN1 | |
| SCHEMBL6272807 | 0.77 | LMNA (0.33) | TSHRALDH1A1PPARG | |
| SCHEMBL13224550 | 0.76 | HTT (0.34) | PSMB1PSMB5PSMB2HIF1AHTT | |
| SCHEMBL3852488 | 0.74 | LMNA (0.52) | TSHRKMT2A | |
| SCHEMBL825332 | 0.74 | NPC1 (0.49) | MAPT | |
| SCHEMBL22882724 | 0.74 | LMNA (0.37) | LTB4RLTB4R2HIF1AMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8178639-B2 | Polymer for forming organic anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2012-05-15 | — | — | US | disclosed |
| US-8026042-B2 | Polymer for organic anti-reflective coating layer and composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2011-09-27 | — | — | US | disclosed |
| US-8026042-B2 | Polymer for organic anti-reflective coating layer and composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2011-09-27 | — | — | US | disclosed |
| US-20110003478-A1 | POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION INCLUDING THE SAME | KIM SANG-JEOUNG | 2011-01-06 | — | — | US | disclosed |
| US-20110003478-A1 | POLYMER FOR ORGANIC ANTI-REFLECTIVE COATING LAYER AND COMPOSITION INCLUDING THE SAME | KIM SANG-JEOUNG | 2011-01-06 | — | — | US | disclosed |
| US-20100266967-A1 | POLYMER FOR FORMING ORGANIC ANTI-REFLECTIVE COATING LAYER | DONGJIN SEMICHEM CO., LTD (KR) | 2010-10-21 | — | — | US | disclosed |
| US-7629110-B2 | polyethersiloxane copolymers used as photoresists for forming semiconductor circuit patterns, using photolithography | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-12-08 | — | — | US | disclosed |
| US-7465531-B2 | Copolyalkylene oxide of optionally substituted alkyl 1,2-epoxypropionate and 9-anthracenylmethyl 2,3-epoxypropionate; between etching layer and photoresist to absorb exposure light in photolithography; prevents the occurrence of standing wave, undercutting and notching to obtain uniform pattern profile | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-12-16 | — | — | US | disclosed |
| US-20080131815-A1 | polyethersiloxane copolymers used as photoresists for forming semiconductor circuit patterns, using photolithography | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-06-05 | — | — | US | disclosed |
| US-7368219-B2 | Polymer for forming anti-reflective coating layer | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-05-06 | — | — | US | disclosed |