Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR1H4 | Q96RI1 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 4/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | APP | P05067 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | APEX1 | P27695 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL196326 | 0.89 | LMNA (0.39) | NR1H4ALDH1A1MAPTNPC1HPGD | |
| SCHEMBL1456662 | 0.89 | LMNA (0.39) | NR1H4ALDH1A1MAPTNPC1RAB9A | |
| SCHEMBL3852488 | 0.86 | LMNA (0.52) | LMNATDP1TSHRKMT2AL3MBTL1 | |
| SCHEMBL12425736 | 0.86 | LMNA (0.37) | NR1H4MAPTNPC1RAB9ALMNA | |
| SCHEMBL825332 | 0.86 | NPC1 (0.49) | MAPTNPC1RAB9ALMNA | |
| SCHEMBL15869162 | 0.84 | PSMB1 (0.36) | NR1H4ALDH1A1MAPTNPC1HPGD | |
| SCHEMBL24564756 | 0.83 | CYP3A4 (0.47) | ALDH1A1MAPTNPC1RAB9ASMN1; SMN2 | |
| SCHEMBL13717573 | 0.82 | ESR1 (0.50) | ALDH1A1HPGDSMN1; SMN2LMNAHSD17B10 | |
| SCHEMBL6272807 | 0.82 | LMNA (0.33) | NR1H4ALDH1A1MAPK1LMNATDP1 | |
| SCHEMBL4065843 | 0.81 | ESR1 (0.37) | ALDH1A1MAPK1MAPTNPC1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11815815-B2 | Composition for forming silicon-containing resist underlayer film removable by wet process | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20200209749-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-07-02 | — | — | US | disclosed |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20170371242-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM REMOVABLE BY WET PROCESS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-12-28 | — | — | US | disclosed |
| US-20170271151-A1 | COATING COMPOSITION FOR PATTERN REVERSAL ON SOC PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-09-21 | — | — | US | disclosed |
| US-9524871-B2 | Silicon-containing resist underlayer film-forming composition having sulfone structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-9291900-B2 | Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-22 | — | — | US | disclosed |
| US-20150249012-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON CONTAINING CYCLIC ORGANIC GROUP HAVING HETERO ATOM | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-03 | — | — | US | disclosed |
| US-20140377957-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION FOR SOLVENT DEVELOPMENT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-12-25 | — | — | US | disclosed |
| US-20140170855-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING SULFONE STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-19 | — | — | US | disclosed |
| US-20130302991-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, CONTAINING SILICON THAT BEARS DIKETONE-STRUCTURE-CONTAINING ORGANIC GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| US-7202015-B2 | Positive photoresist composition and pattern making method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-10 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200209749-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HACL2, NEK10, ACAD10 | NR1H4 441/4885ALDH1A1 1837/4885MAPK1 3812/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | NR1H4 3632/4885ALDH1A1 1552/4885MAPK1 428/4885 |
| US-20180181000-A1 | RADIATION SENSITIVE COMPOSITION | RER1, RAD1, RAD51 | NR1H4 2459/4885ALDH1A1 1670/4885MAPK1 2769/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | NR1H4 729/4885ALDH1A1 1388/4885MAPK1 1253/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.