SCHEMBL5561963

SCHEMBL5561963

Nc1cccc(S(=O)(=O)c2cccc(N)c2)c1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 1.00
CA2 P00918 5/20 0.71
CA1 P00915 4/20 0.71
CA12 O43570 3/20 0.71
CA9 Q16790 3/20 0.71
CA4 P22748 2/20 0.71
CA14 Q9ULX7 1/20 0.71
TSHR P16473 2/20 0.68
ALDH1A1 P00352 2/20 0.68
HSD17B10 Q99714 1/20 0.68
TDP1 Q9NUW8 1/20 0.68
F2 P00734 3/20 0.57
PRSS1 P07477 3/20 0.57
PRSS2 P07478 3/20 0.57
PRSS3 P35030 3/20 0.57
ANXA2 P07355 1/20 0.55
S100A10 P60903 1/20 0.55
POLB P06746 1/20 0.55
CYP3A4 P08684 2/20 0.52
CASP1 P29466 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29635012 1.00 LMNA (1.00) LMNACA2CA1CA12CA9
SCHEMBL34546 1.00 LMNA (1.00) LMNACA2CA1CA12CA9
SCHEMBL30544199 1.00 LMNA (1.00) LMNACA2CA1CA12CA9
SCHEMBL324628 0.98 LMNA (0.95) LMNACA2CA1CA12CA9
Benzene SCHEMBL27752989 0.98 LMNA (0.95) LMNACA2CA1CA12CA9
SCHEMBL1100221 0.95 LMNA (0.91) LMNACA2CA1CA12CA9
SCHEMBL487472 0.93 LMNA (0.87) LMNACA2CA1CA12CA9
SCHEMBL29692583 0.91 LMNA (0.83) LMNACA2CA1CA12CA9
SCHEMBL34500 0.91 LMNA (0.83) LMNACA2CA1CA12CA9
SCHEMBL8721954 0.91 LMNA (0.83) LMNACA2CA1CA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4036159-B1 POLYIMIDE-BASED FILM HAVING EXCELLENT SURFACE EVENNESS AND METHOD FOR PRODUCING SAME KOLON INC (KR) 2025-08-06 EP claimed
EP-2800104-B1 PLASTIC SUBSTRATE KOLON INC (KR) 2021-01-27 EP claimed
EP-2766920-B1 SPIN-ON CARBON COMPOSITIONS FOR LITHOGRAPHIC PROCESSING BREWER SCIENCE INC (US) 2020-12-02 EP claimed
EP-0085024-B1 METHOD FOR PRODUCING IMAGES IN PHOTORESIST LAYERS CIBA-GEIGY AG (CH) 1987-07-15 EP claimed
EP-0085024-A2 Method for producing images in photoresist layers CIBA-GEIGY AG (CH) 1983-08-03 EP claimed
EP-1648950-B1 THERMOHARDENING COMPOSITIONS COMPRISING LOW-TEMPERATURE IMPACT STRENGTH MODIFIERS SIKA TECHNOLOGY AG (CH) 2007-06-13 EP disclosed
EP-1720952-A1 TWO-COMPONENT ADHESIVE FOR PRODUCING SEMI-FINISHED PRODUCTS AND COMPOSITE SANDWICH MATERIALS Sika Technology AG (CH) 2006-11-15 EP disclosed
EP-1578838-B1 THERMALLY CUARBLE EPOXY RESIN COMPOSITION HAVING AN IMPROVED IMPACT RESISTANCE AT LOW TEMPERATURES SIKA TECHNOLOGY AG (CH) 2006-08-23 EP disclosed
EP-1648950-A1 THERMOHARDENING COMPOSITIONS COMPRISING LOW-TEMPERATURE IMPACT STRENGTH MODIFIERS Sika Technology AG (CH) 2006-04-26 EP disclosed
EP-1578838-A1 THERMALLY HARDENABLE EPOXY RESIN COMPOSITION HAVING AN IMPROVED IMPACT RESISTANCE AT LOW TEMPERATURES Sika Technology AG (CH) 2005-09-28 EP disclosed
WO-2005080524-A1 TWO-COMPONENT ADHESIVE FOR PRODUCING SEMI-FINISHED PRODUCTS AND COMPOSITE SANDWICH MATERIALS SIKA TECHNOLOGY AG (CH) 2005-09-01 WO disclosed
EP-1568749-A1 Two-component adhesive for producing semi-finished products and sandwich composites Sika Technology AG (CH) 2005-08-31 EP disclosed
EP-0099338-B1 EPOXY RESIN SYSTEMS MODIFIED WITH THERMOPLASTIC RESINS CIBA-GEIGY AG (CH) 1986-05-14 EP disclosed
EP-0066546-B1 EPOXIDE RESIN COMPOSITIONS CONTAINING ESTERS AS A DILUTING AGENT AND HARDENING ACCELERATORS CIBA-GEIGY AG (CH) 1985-12-18 EP disclosed
EP-0143075-A1 Process for the preparation of N-glycidyl compounds CIBA-GEIGY AG (CH) 1985-05-29 EP disclosed
EP-0079857-B1 PROCESS FOR INCREASING THE VISCOSITY OF MIXTURES CONTAINING EPOXY RESINS CIBA-GEIGY AG (CH) 1985-02-20 EP disclosed
EP-0099338-A1 Epoxy resin systems modified with thermoplastic resins CIBA-GEIGY AG (CH) 1984-01-25 EP disclosed
EP-0085024-A2 Method for producing images in photoresist layers CIBA-GEIGY AG (CH) 1983-08-03 EP disclosed
EP-0079857-A1 Process for increasing the viscosity of mixtures containing epoxy resins CIBA-GEIGY AG (CH) 1983-05-25 EP disclosed
EP-0066546-A2 Epoxide resin compositions containing esters as a diluting agent and hardening accelerators CIBA-GEIGY AG (CH) 1982-12-08 EP disclosed