⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5570896 | 0.90 | — | — | |
| SCHEMBL5574661 | 0.83 | — | — | |
| SCHEMBL482327 | 0.78 | KDM4E (0.39) | — | |
| SCHEMBL11062062 | 0.77 | — | — | |
| SCHEMBL103279 | 0.74 | — | — | |
| SCHEMBL12492209 | 0.72 | — | — | |
| SCHEMBL5889629 | 0.71 | — | — | |
| SCHEMBL482289 | 0.70 | KDM4E (0.38) | — | |
| SCHEMBL715641 | 0.69 | THRB (0.33) | — | |
| SCHEMBL702848 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070269747-A1 | Lithography Technique Using Silicone Molds | DOW CORNING CORPORATION | 2007-11-22 | — | — | US | disclosed |
| EP-1803033-A2 | LITHOGRAPHY TECHNIQUE USING SILICONE MOLDS | Dow Corning Corporation (US) | 2007-07-04 | — | — | EP | disclosed |
| WO-2006031455-A2 | LITHOGRAPHY TECHNIQUE USING SILICONE MOLDS | DOW CORNING CORPORATION (US) | 2006-03-23 | — | — | WO | disclosed |