Acetic Acid

Acetic Acid

SCHEMBL557807

CC(=O)[O-].CCC[N+](C)(CCC)CCC

nearest known ligand 0.44

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Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.44
BBOX1 O75936 3/20 0.43
FFAR3 O14843 2/20 0.39
HDAC3 O15379 2/20 0.39
HDAC1 Q13547 2/20 0.39
HDAC2 Q92769 2/20 0.39
HDAC8 Q9BY41 2/20 0.39
CES1 P23141 3/20 0.36
CES2 O00748 2/20 0.36
CYP3A4 P08684 2/20 0.35
TSHR P16473 2/20 0.35
NFKB1 P19838 2/20 0.35
NPSR1 Q6W5P4 2/20 0.35
ACHE P22303 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Oxalic Acid SCHEMBL1050654 0.89 BBOX1 (0.43) CA1BBOX1FFAR3HDAC3HDAC1
Bicarbonate SCHEMBL31088022 0.89 BBOX1 (0.43) CA1BBOX1FFAR3HDAC3HDAC1
Propionic Acid SCHEMBL5571744 0.86 BBOX1 (0.46) CA1BBOX1FFAR3HDAC3HDAC1
Methacrylic Acid SCHEMBL4921851 0.85 BBOX1 (0.38) CA1BBOX1FFAR3HDAC3HDAC1
Tributylmethylammonium SCHEMBL557386 0.84 BBOX1 (0.50) CA1BBOX1CES1CES2
Oxalic Acid SCHEMBL1050657 0.84 BBOX1 (0.40) CA1BBOX1FFAR3HDAC3HDAC1
Acetic Acid SCHEMBL3684341 0.83 CA1 (0.44) CA1BBOX1FFAR3HDAC3HDAC1
Acetic Acid SCHEMBL27957649 0.83 DNM1 (0.46) CA1BBOX1FFAR3HDAC3HDAC1
Tributylmethylammonium SCHEMBL9790243 0.82 BBOX1 (0.48) CA1BBOX1FFAR3HDAC3HDAC1
Acetic Acid SCHEMBL5574989 0.82 BBOX1 (0.48) BBOX1CES1CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1669383-B1 CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME TOSOH CORP (JP) 2014-11-12 EP claimed
US-8779018-B2 Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polyurethane foam and raw-material composition containing the same TOSOH CORPORATION (JP) 2014-07-15 US claimed
EP-2050775-B1 CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN TOSOH CORP (JP) 2013-08-14 EP claimed
US-20120035289-A1 CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME TOSOH CORPORATION (JP) 2012-02-09 US claimed
CN-101501092-B Catalyst composition for polyurethane resin production and method for producing polyurethane resin TOSOH CORP 2011-09-28 CN claimed
CN-1860147-B Catalyst composition for manufacturing rigid polyurethane foam and isocyanurate-modified rigid polyurethane foam, and raw material formulation composition using the same TOSOH CORP 2010-06-16 CN claimed
US-20100130629-A1 CATALYST COMPOSITION FOR PRODUCTION OF POLYURETHANE RESIN AND METHOD FOR PRODUCING POLYURETHANE RESIN (AS AMENDED) TOSOH CORPORATION (JP) 2010-05-27 US claimed
CN-101501092-A Catalyst composition for polyurethane resin production and method for producing polyurethane resin TOSOH CORP (JP) 2009-08-05 CN claimed
EP-2050775-A1 CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN Tosoh Corporation (JP) 2009-04-22 EP claimed
US-20070112085-A1 Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polysurethane foam and raw-material composition containing the same TOSOH CORPORATION (JP) 2007-05-17 US claimed
CN-1860147-A Catalyst composition for manufacturing rigid polyurethane foam and isocyanurate-modified rigid polyurethane foam, and raw material formulation composition using the same TOSOH CORP (JP) 2006-11-08 CN claimed
EP-1669383-A1 CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME Tosoh Corporation (JP) 2006-06-14 EP claimed
EP-4045000-A1 SOLUTION OF CELLULOSE IN A QUATERNARY AMMONIUM COMPOUND AND A CO-SOLVENT BASF SE (DE) 2022-08-24 EP disclosed
WO-2021073961-A1 SOLUTION OF CELLULOSE IN A QUATERNARY AMMONIUM COMPOUND AND A CO-SOLVENT BASF SE (DE) 2021-04-22 WO disclosed
EP-1669383-B1 CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME TOSOH CORP (JP) 2014-11-12 EP disclosed
US-8877825-B2 Catalyst composition for production of polyurethane resin and method for producing polyurethane resin TOSOH CORPORATION (JP) 2014-11-04 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1669383-A1 CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME Tosoh Corporation (JP) 2006-06-14 EP disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed