Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18124258 | 0.75 | TDP1 (0.36) | TDP1 | |
| Hydrochloric Acid SCHEMBL5224953 | 0.73 | TSHR (0.37) | BBOX1 | |
| SCHEMBL1703982 | 0.73 | POLB (0.41) | BBOX1 | |
| SCHEMBL10187392 | 0.72 | GSR (0.56) | — | |
| Methacrylic Acid SCHEMBL29027514 | 0.71 | CPT2 (0.34) | BBOX1TDP1 | |
| Methacrylic Acid SCHEMBL27611917 | 0.71 | GRIK1 (0.32) | TDP1 | |
| SCHEMBL12587298 | 0.70 | CA1 (0.54) | BBOX1TDP1 | |
| SCHEMBL19971910 | 0.69 | TDP1 (0.31) | TDP1 | |
| Hydrochloric Acid SCHEMBL525772 | 0.69 | ACHE (0.44) | BBOX1 | |
| SCHEMBL21078232 | 0.69 | TDP1 (0.32) | TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20060127643-A1 | Light-scattering materials which have self-cleaning sufraces | CREAVIS GESELLSCHAFT FUER TECH. UND INNOVATION MBH (DE) | 2006-06-15 | — | — | US | claimed |
| US-20060127644-A1 | Diffuse-reflection surfaces and process for their production | CREAVIS GESELLSCHAFT FUR TECH. UND INNOVATION MBH (DE) | 2006-06-15 | — | — | US | claimed |
| US-20030108716-A1 | Transparent material with a coating randomly distributed on a surface with elevations separated by < 100 mu m and elevations that are a height of 20 nm-100 mu m | CREAVIS GESELLSCHAFT FUER TECH. UND INNOVATION MBH (DE) | 2003-06-12 | — | — | US | claimed |
| CN-106232092-B | Antimicrobial compositions containing cationic active ingredients | 艺康美国股份有限公司 | 2020-07-14 | — | — | CN | disclosed |
| CN-1328296-C | Polymer compositions and process for preparing polymers | ROHM & HAAS (US) | 2007-07-25 | — | — | CN | disclosed |
| EP-1773421-A1 | A HYDROPHILIC, WATER-SWELLABLE, CROSS-LINKED MATRIX HAVING INCORPORATED THEREIN AN ANTI-MICROBIAL POLYMER | COLOPLAST A/S (DK) | 2007-04-18 | — | — | EP | disclosed |
| US-20060127643-A1 | Light-scattering materials which have self-cleaning sufraces | CREAVIS GESELLSCHAFT FUER TECH. UND INNOVATION MBH (DE) | 2006-06-15 | — | — | US | disclosed |
| US-20060127644-A1 | Diffuse-reflection surfaces and process for their production | CREAVIS GESELLSCHAFT FUR TECH. UND INNOVATION MBH (DE) | 2006-06-15 | — | — | US | disclosed |
| WO-2006002628-A1 | A HYDROPHILIC, WATER-SWELLABLE, CROSS-LINKED MATRIX HAVING INCORPORATED THEREIN AN ANTI-MICROBIAL POLYMER | COLOPLAST A/S (DK) | 2006-01-12 | — | — | WO | disclosed |
| CN-1572805-A | Polymer compositions and process for preparing polymers | ROHM & HAAS (US) | 2005-02-02 | — | — | CN | disclosed |
| US-20040144657-A1 | Process for the surface-immobililzation of anti-microbial polymers by metal deposition | DEGUSSA AG (DE) | 2004-07-29 | — | — | US | disclosed |
| US-20030108716-A1 | Transparent material with a coating randomly distributed on a surface with elevations separated by < 100 mu m and elevations that are a height of 20 nm-100 mu m | CREAVIS GESELLSCHAFT FUER TECH. UND INNOVATION MBH (DE) | 2003-06-12 | — | — | US | disclosed |
| US-5959016-A | POLYMER WITH PENDANT CATIONIC GROUPS AND WEAK SALT GROUPS AND SOLVENT WITH POLYVALENT METAL COMPLEXES TACK-FREE, SOLVENT-RESISTANT COATING. | THE DOW CHEMICAL COMPANY (US) | 1999-09-28 | — | — | US | disclosed |
| US-5910532-A | COMPOSITION COMPRISING POLYMER CONTAINING STRONG CATIONIC GROUPS AND ACID GROUPS DISPERSED IN MULTISOLVENT MEDIUM CONTAINING WATER, LOW BOILING POLAR ORGANIC SOLVENT, HIGH BOILING SOLVENT | THE DOW CHEMICAL COMPANY (US) | 1999-06-08 | — | — | US | disclosed |