Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 9/20 | 0.72 |
| ▸ | CACNA2D1 | P54289 | 1/20 | 0.70 |
| ▸ | POLB | P06746 | 3/20 | 0.68 |
| ▸ | RAD52 | P43351 | 3/20 | 0.68 |
| ▸ | RAB9A | P51151 | 2/20 | 0.67 |
| ▸ | NPC1 | O15118 | 1/20 | 0.67 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.67 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.67 |
| ▸ | LMNA | P02545 | 2/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.62 |
| ▸ | MITF | O75030 | 1/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.62 |
| ▸ | TTR | P02766 | 1/20 | 0.62 |
| ▸ | GLA | P06280 | 1/20 | 0.62 |
| ▸ | GAA | P10253 | 1/20 | 0.62 |
| ▸ | TOP2A | P11388 | 4/20 | 0.60 |
| ▸ | ELANE | P08246 | 2/20 | 0.57 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.56 |
| ▸ | S1PR2 | O95136 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9415866 | 0.98 | SLC2A1 (0.75) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| Hydrochloric Acid SCHEMBL8651166 | 0.97 | SLC2A1 (0.78) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| SCHEMBL9748474 | 0.95 | POLB (0.70) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| SCHEMBL5578493 | 0.91 | POLB (0.79) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| SCHEMBL6033155 | 0.89 | POLB (0.77) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| SCHEMBL13856923 | 0.89 | POLB (0.77) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| SCHEMBL28158394 | 0.87 | POLB (0.68) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| SCHEMBL7869214 | 0.87 | POLB (0.79) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| Hydrochloric Acid SCHEMBL18334834 | 0.86 | POLB (0.72) | SLC2A1CACNA2D1POLBRAD52RAB9A | |
| SCHEMBL92770 | 0.84 | SLC2A1 (0.59) | SLC2A1CACNA2D1POLBRAD52RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106233205-B | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | 日立化成株式会社 | 2020-06-23 | — | — | CN | claimed |
| US-20120035320-A1 | POLYACRIDINE NUCLEIC ACID DELIVERY PEPTIDE COMPLEXES | UNIVERSITY OF IOWA RESEARCH FOUNDATION (US) | 2012-02-09 | — | — | US | claimed |
| WO-2026105768-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | 株式会社レゾナック | 2026-05-21 | — | — | WO | disclosed |
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| US-20240392048-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | RESONAC CORP (JP) | 2024-11-28 | — | — | US | disclosed |
| WO-2024176541-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-08-29 | — | — | WO | disclosed |
| WO-2024176305-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-08-29 | — | — | WO | disclosed |
| WO-2024135501-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN | 株式会社レゾナック | 2024-06-27 | — | — | WO | disclosed |
| EP-4388020-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | Resonac Corporation (JP) | 2024-06-26 | — | — | EP | disclosed |
| WO-2024116247-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-06-06 | — | — | WO | disclosed |
| US-20170045817-A1 | PHOTOSENSITIVE ELEMENT, LAMINATE, PERMANENT MASK RESIST, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR PACKAGE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| US-9235121-B2 | Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20140154628-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE FILM, PERMANENT RESIST AND METHOD FOR PRODUCING PERMANENT RESIST | RESONAC CORPORATION (JP) | 2014-06-05 | — | — | US | disclosed |
| US-20130298398-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| US-20120035320-A1 | POLYACRIDINE NUCLEIC ACID DELIVERY PEPTIDE COMPLEXES | UNIVERSITY OF IOWA RESEARCH FOUNDATION (US) | 2012-02-09 | — | — | US | disclosed |
| US-7232663-B2 | Assays employing novel substrates for measuring P450-mediated N-dealkylation | THE UNIVERSITY OF WYOMING (US) | 2007-06-19 | — | — | US | disclosed |
| US-7232663-B2 | Assays employing novel substrates for measuring P450-mediated N-dealkylation | THE UNIVERSITY OF WYOMING (US) | 2007-06-19 | — | — | US | disclosed |
| US-20070015235-A1 | Assays employing novel substrates for measuring P450-mediated N-dealkylation | UNIVERSITY OF WYOMING, THE | 2007-01-18 | — | — | US | disclosed |
| US-20070015235-A1 | Assays employing novel substrates for measuring P450-mediated N-dealkylation | UNIVERSITY OF WYOMING, THE | 2007-01-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | SLC2A1 2938/4885CACNA2D1 3303/4885POLB 2332/4885 |
| US-20120035320-A1 | POLYACRIDINE NUCLEIC ACID DELIVERY PEPTIDE COMPLEXES | NUP205, PABPC1, SARNP | SLC2A1 830/4885CACNA2D1 4338/4885POLB 102/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.