Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.49 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.39 |
| ▸ | RELA | Q04206 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL499375 | 0.86 | CYP1A2 (0.54) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL5490056 | 0.84 | ALDH1A1 (0.51) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL12050502 | 0.84 | ALDH1A1 (0.58) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL27918543 | 0.84 | ALDH1A1 (0.58) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL11239221 | 0.84 | ALDH1A1 (0.55) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL5583400 | 0.83 | ALDH1A1 (0.56) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL7877336 | 0.80 | CYP1A2 (0.55) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL2821430 | 0.80 | ALDH1A1 (0.51) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 | |
| SCHEMBL8067996 | 0.79 | ALDH1A1 (0.59) | ALDH1A1CYP1A2TSHRTDP1MAPT | |
| SCHEMBL6895354 | 0.79 | ALDH1A1 (0.52) | ALDH1A1CYP1A2TSHRTDP1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1239332-B1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | AZ ELECTRONIC MATERIALS USA (US) | 2007-02-21 | — | — | EP | disclosed |
| US-20060160014-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2006-07-20 | — | — | US | disclosed |
| US-20050287469-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2005-12-29 | — | — | US | disclosed |
| EP-1560069-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1548499-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-6902875-B2 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-07 | — | — | US | disclosed |
| US-20040081912-A1 | Photosensitive polysilazane composition and method of forming patterned polysilazane film | AZ ELECTRONIC MATERIALS USA CORP. | 2004-04-29 | — | — | US | disclosed |
| US-20030113657-A1 | Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | MERCK PATENT GMBH (DE) | 2003-06-19 | — | — | US | disclosed |
| EP-1239332-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2002-09-11 | — | — | EP | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |