Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GSR | P00390 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CES1 | P23141 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | SRC | P12931 | 1/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5583368 | 0.84 | GSR (0.38) | GSRALDH1A1CYP3A4MAPTCYP2D6 | |
| SCHEMBL286963 | 0.81 | GSR (0.43) | GSRALDH1A1CYP3A4CES1MAPT | |
| SCHEMBL22323630 | 0.81 | GSR (0.43) | GSRALDH1A1CYP3A4CES1CYP2D6 | |
| SCHEMBL5932816 | 0.80 | GSR (0.42) | GSRALDH1A1CYP3A4CES1MAPT | |
| SCHEMBL5932183 | 0.78 | GSR (0.41) | GSRALDH1A1CYP3A4CES1CYP2D6 | |
| SCHEMBL258789 | 0.78 | GSR (0.41) | GSRALDH1A1CYP3A4CES1CYP2D6 | |
| SCHEMBL3299147 | 0.78 | ALDH1A1 (0.49) | GSRALDH1A1CYP3A4CYP2D6SRC | |
| SCHEMBL38107 | 0.78 | NPSR1 (0.43) | GSRALDH1A1MAPTNPSR1CYP2D6 | |
| SCHEMBL10640253 | 0.78 | GSR (0.41) | GSRALDH1A1CYP3A4CES1MAPT | |
| SCHEMBL4277062 | 0.77 | TSHR (0.50) | GSRALDH1A1CYP3A4CES1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100395662-C | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | CLARIANT INT LTD (JP) | 2008-06-18 | — | — | CN | disclosed |
| EP-1239332-B1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | AZ ELECTRONIC MATERIALS USA (US) | 2007-02-21 | — | — | EP | disclosed |
| US-20060160014-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2006-07-20 | — | — | US | disclosed |
| US-20050287469-A1 | Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric | NAGAHARA TATSURO | 2005-12-29 | — | — | US | disclosed |
| EP-1560069-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-08-03 | — | — | EP | disclosed |
| EP-1548499-A1 | PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC | AZ Electronic Materials (Japan) K.K. (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-6902875-B2 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-07 | — | — | US | disclosed |
| US-20040081912-A1 | Photosensitive polysilazane composition and method of forming patterned polysilazane film | AZ ELECTRONIC MATERIALS USA CORP. | 2004-04-29 | — | — | US | disclosed |
| US-20030113657-A1 | Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | MERCK PATENT GMBH (DE) | 2003-06-19 | — | — | US | disclosed |
| CN-1388920-A | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof | CLARIANT INT LTD (CH) | 2003-01-01 | — | — | CN | disclosed |
| EP-1239332-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2002-09-11 | — | — | EP | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |