Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8048860 | 0.92 | LMNA (0.56) | LMNATHRBTSHR | |
| SCHEMBL3921436 | 0.90 | LMNA (0.62) | LMNATHRBTSHR | |
| SCHEMBL19180080 | 0.89 | LMNA (0.48) | LMNATHRBTSHR | |
| SCHEMBL19493226 | 0.86 | LMNA (0.52) | LMNATHRBTSHR | |
| SCHEMBL7644910 | 0.86 | LMNA (0.73) | LMNATHRBTSHR | |
| SCHEMBL28585659 | 0.85 | LMNA (0.52) | LMNATSHR | |
| SCHEMBL4891542 | 0.84 | LMNA (0.45) | LMNATSHR | |
| SCHEMBL4889457 | 0.84 | LMNA (0.45) | LMNATSHR | |
| SCHEMBL8901993 | 0.82 | LMNA (0.43) | LMNATHRBTSHR | |
| SCHEMBL4889324 | 0.80 | LMNA (0.41) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250231491-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-11493845-B2 | Organic bottom antireflective coating composition for nanolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2022-11-08 | — | — | US | disclosed |
| US-20210380612-A1 | PHOTORESIST COMPOSITIONS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-12-09 | — | — | US | disclosed |
| US-11092894-B2 | Method for forming pattern using anti-reflective coating composition comprising photoacid generator | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-08-17 | — | — | US | disclosed |
| CN-105223774-B | Method of forming pattern using anti-reflective coating composition including photoacid generator | 罗门哈斯电子材料韩国有限公司 | 2019-12-20 | — | — | CN | disclosed |
| US-20160187781-A1 | METHOD FOR FORMING PATTERN USING ANTI-REFLECTIVE COATING COMPOSITION COMPRISING PHOTOACID GENERATOR | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2016-06-30 | — | — | US | disclosed |
| US-20150185614-A1 | ORGANIC BOTTOM ANTIREFLECTIVE COATING COMPOSITION FOR NANOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2015-07-02 | — | — | US | disclosed |
| US-8927681-B2 | Coating composition for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-06 | — | — | US | disclosed |
| US-20120034562-A1 | COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST | WAYTON GERALD B (US) | 2012-02-09 | — | — | US | disclosed |
| US-20070020557-A1 | New organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-01-25 | — | — | US | disclosed |
| US-7163751-B2 | spin-on antireflective coating compositions that contain an aromatic polyester resin and a solvent comprising an oxyisobutyric acid ester, especially methyl-2-hydroxyisobutyrate; | SHIPLEY COMPANY, L.L.C. (US) | 2007-01-16 | — | — | US | disclosed |
| US-20060057491-A1 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2006-03-16 | — | — | US | disclosed |
| EP-1598702-A1 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2005-11-23 | — | — | EP | disclosed |
| WO-2005097883-A2 | METHOD OF PRODUCING A CROSSLINKED COATING IN THE MANUFACTURE OF INTEGRATED CIRCUITS | KING INDUSTRIES, INC. (US) | 2005-10-20 | — | — | WO | disclosed |
| US-20050215713-A1 | Method of producing a crosslinked coating in the manufacture of integrated circuits | KING INDUSTRIES, INC. | 2005-09-29 | — | — | US | disclosed |
| US-6852421-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-08 | — | — | US | disclosed |
| US-20040209200-A1 | spin-on antireflective coating compositions that contain an aromatic polyester resin and a solvent comprising an oxyisobutyric acid ester, especially methyl-2-hydroxyisobutyrate; | SHIPLEY COMPANY, L.L.C. | 2004-10-21 | — | — | US | disclosed |
| US-20030180559-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. | 2003-09-25 | — | — | US | disclosed |
| EP-1298492-A2 | Coating compositions for use with an overcoated photoresist | Shipley Co. L.L.C. (US) | 2003-04-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210380612-A1 | PHOTORESIST COMPOSITIONS | NPM1, PORCN, PPOX | LMNA 3401/4885THRB 4782/4885TSHR 4671/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.