Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL259584 | 0.76 | — | — | |
| SCHEMBL8968643 | 0.73 | — | — | |
| SCHEMBL10712669 | 0.71 | TSHR (0.33) | ALDH1A1TP53TSHR | |
| SCHEMBL3244472 | 0.67 | ALDH1A1 (0.36) | ALDH1A1TSHR | |
| SCHEMBL6751899 | 0.65 | FDPS (0.39) | ALDH1A1TP53TSHR | |
| Benzene SCHEMBL10830312 | 0.65 | ALDH1A1 (0.35) | ALDH1A1TP53TSHR | |
| SCHEMBL6591460 | 0.65 | — | — | |
| Trichlorethanol SCHEMBL28825711 | 0.64 | TSHR (0.41) | ALDH1A1TP53TSHR | |
| Trichlorethanol SCHEMBL1027 | 0.62 | — | — | |
| Trichlorethanol SCHEMBL28245853 | 0.62 | LMNA (0.36) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101223205-A | Novel organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA (US) | 2008-07-16 | — | — | CN | claimed |
| US-20070020557-A1 | New organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-01-25 | — | — | US | claimed |
| US-4088500-A | AMIDE-ENDCAPPED HYDROPHILIC ALKYLENE OXIDE PREPOLYMER, ACID ACTIVATED CROSSLINKING AGENT WATER, FILLER, CATALYST | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1978-05-09 | — | — | US | claimed |
| US-11493845-B2 | Organic bottom antireflective coating composition for nanolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2022-11-08 | — | — | US | disclosed |
| US-11092894-B2 | Method for forming pattern using anti-reflective coating composition comprising photoacid generator | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-08-17 | — | — | US | disclosed |
| CN-105223774-B | Method of forming pattern using anti-reflective coating composition including photoacid generator | 罗门哈斯电子材料韩国有限公司 | 2019-12-20 | — | — | CN | disclosed |
| US-20160187781-A1 | METHOD FOR FORMING PATTERN USING ANTI-REFLECTIVE COATING COMPOSITION COMPRISING PHOTOACID GENERATOR | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2016-06-30 | — | — | US | disclosed |
| US-20150185614-A1 | ORGANIC BOTTOM ANTIREFLECTIVE COATING COMPOSITION FOR NANOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2015-07-02 | — | — | US | disclosed |
| US-8927681-B2 | Coating composition for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-06 | — | — | US | disclosed |
| US-20120034562-A1 | COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST | WAYTON GERALD B (US) | 2012-02-09 | — | — | US | disclosed |
| US-7582360-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| EP-1598702-A1 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2005-11-23 | — | — | EP | disclosed |
| WO-2005097883-A2 | METHOD OF PRODUCING A CROSSLINKED COATING IN THE MANUFACTURE OF INTEGRATED CIRCUITS | KING INDUSTRIES, INC. (US) | 2005-10-20 | — | — | WO | disclosed |
| US-20050215713-A1 | Method of producing a crosslinked coating in the manufacture of integrated circuits | KING INDUSTRIES, INC. | 2005-09-29 | — | — | US | disclosed |
| US-6852421-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-08 | — | — | US | disclosed |
| US-20040209200-A1 | spin-on antireflective coating compositions that contain an aromatic polyester resin and a solvent comprising an oxyisobutyric acid ester, especially methyl-2-hydroxyisobutyrate; | SHIPLEY COMPANY, L.L.C. | 2004-10-21 | — | — | US | disclosed |
| CN-1482192-A | Coating compositions for use with an overcoated photoresist | 希普雷公司 | 2004-03-17 | — | — | CN | disclosed |
| US-20030180559-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. | 2003-09-25 | — | — | US | disclosed |
| EP-1298492-A2 | Coating compositions for use with an overcoated photoresist | Shipley Co. L.L.C. (US) | 2003-04-02 | — | — | EP | disclosed |
| US-4088500-A | AMIDE-ENDCAPPED HYDROPHILIC ALKYLENE OXIDE PREPOLYMER, ACID ACTIVATED CROSSLINKING AGENT WATER, FILLER, CATALYST | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1978-05-09 | — | — | US | disclosed |