Methylsulfanylmethane

Methylsulfanylmethane

SCHEMBL5636396

CSC.O=C(Oc1ccc(O)c2ccccc12)C(F)(F)F

nearest known ligand 0.44

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 10/20 0.44
▸ ESR2 Q92731 10/20 0.44
▸ MEN1 O00255 3/20 0.44
▸ KMT2A Q03164 3/20 0.44
▸ JAK2 O60674 1/20 0.44
▸ USP2 O75604 1/20 0.44
▸ GAA P10253 1/20 0.44
▸ MAPT P10636 1/20 0.44
▸ ALOX15 P16050 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ NPSR1 Q6W5P4 1/20 0.44
▸ HSD17B10 Q99714 1/20 0.44
▸ IDO1 P14902 3/20 0.41
▸ POLB P06746 1/20 0.40
▸ PKM P14618 1/20 0.37
▸ NPC1 O15118 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ RAB9A P51151 1/20 0.37
▸ HDAC3 O15379 1/20 0.37
▸ EP300 Q09472 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18785662 0.81 ELANE (0.53) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL8737835 0.79 ESR1 (0.44) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL22454743 0.78 ESR1 (0.46) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL11991239 0.76 ESR1 (0.44) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL1130148 0.76 TSHR (0.37) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL27842430 0.75 ESR1 (0.53) ESR1ESR2MEN1KMT2AJAK2
Methylsulfanylmethane SCHEMBL22441905 0.75 ESR1 (0.48) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL18671905 0.74 ESR1 (0.42) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL13161550 0.72 ESR1 (0.41) ESR1ESR2MEN1KMT2AJAK2
SCHEMBL4082182 0.72 ALDH1A1 (0.56) MEN1KMT2AGAAMAPTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7108954-B2 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2006-09-19 — — US disclosed
US-6797453-B2 WHICH HAS RESOLUTION HIGH ENOUGH TO FORM THROUGH HOLE OR U-SHAPED DEPRESSION; COMPRISES SILANE COUPLING AGENT; FOR ELECTROLUMINESCENT LIQUID CRYSTAL DISPLAYS JSR CORPORATION (JP) 2004-09-28 — — US disclosed
US-20040013972-A1 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2004-01-22 — — US disclosed
US-20030215737-A1 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR CORPORATION (JP) 2003-11-20 — — US disclosed
EP-1350814-A1 RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX JSR Corporation (JP) 2003-10-08 — — EP disclosed
EP-1331518-A2 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR Corporation (JP) 2003-07-30 — — EP disclosed
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