Biphenyl

Biphenyl

SCHEMBL5636682

C1CCC(C2CCCCC2)CC1.CCC(C)O[SiH2]OC(C)CC

nearest known ligand 0.37

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Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.37
ALDH1A1 P00352 1/20 0.33
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL106925 0.79 TSHR (0.32)
Biphenyl SCHEMBL3836338 0.78 ALDH1A1 (0.40) SHBGALDH1A1
SCHEMBL28236997 0.78 ALDH1A1 (0.40) SHBGALDH1A1
SCHEMBL3273986 0.78 ALDH1A1 (0.40) SHBGALDH1A1
SCHEMBL28236989 0.75 ALDH1A1 (0.42) ALDH1A1
Butane SCHEMBL2495676 0.74
SCHEMBL23174604 0.72 SHBG (0.33) SHBG
Biphenyl SCHEMBL3842729 0.69 ALDH1A1 (0.40) SHBGALDH1A1
Butadiene SCHEMBL1226927 0.69
SCHEMBL3839878 0.69 ALDH1A1 (0.40) SHBGALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7108954-B2 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2006-09-19 US disclosed
US-6828078-B2 Photoresist for use in optoelectronic and display fields; porosity; optical fibers JSR CORPORATION (JP) 2004-12-07 US disclosed
US-20040013972-A1 Radiation-sensitive composition changing in refractive index and method of changing refractive index JSR CORPORATION (JP) 2004-01-22 US disclosed
EP-1350814-A1 RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX JSR Corporation (JP) 2003-10-08 EP disclosed
US-20030064303-A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern JSR CORPORATION (JP) 2003-04-03 US disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed