SCHEMBL564728

SCHEMBL564728

Nc1cccc(S(=O)(=O)c2cccc(N)c2O)c1O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.60
TTR P02766 1/20 0.48
MMP2 P08253 1/20 0.47
HTR6 P50406 1/20 0.47
CA9 Q16790 2/20 0.46
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CYP2C9 P11712 1/20 0.46
CA4 P22748 1/20 0.46
CA6 P23280 1/20 0.46
CA5A P35218 1/20 0.46
CA7 P43166 1/20 0.46
CA14 Q9ULX7 1/20 0.46
CA5B Q9Y2D0 1/20 0.46
ACLY P53396 1/20 0.43
CDK2 P24941 1/20 0.41
ALPL P05186 1/20 0.40
ALPI P09923 1/20 0.40
ALPG P10696 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL565003 0.86 HTR6 (0.69) GAATTRMMP2HTR6CA9
SCHEMBL3030725 0.84 TTR (0.62) GAATTRMMP2HTR6CA9
SCHEMBL1121320 0.84 CA1 (0.61) GAATTRMMP2HTR6CA9
SCHEMBL6286174 0.83 TTR (0.46) GAATTRMMP2HTR6CA9
SCHEMBL20760437 0.83 TTR (0.46) GAATTRMMP2HTR6CA9
SCHEMBL8023642 0.79 ACLY (0.49) GAATTRMMP2HTR6CA9
SCHEMBL28902259 0.79 GAA (0.44) GAATTRMMP2HTR6CA9
SCHEMBL12086969 0.78 ALDH1A1 (0.45) GAATTRMMP2HTR6CA9
SCHEMBL28507456 0.78 GAA (0.45) GAATTRMMP2HTR6CA9
SCHEMBL6735351 0.78 GAA (0.50) GAATTRMMP2HTR6CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106795285-B Polyimide solution, heat-resistant nonwoven fabric, and method for producing same 东丽株式会社 2020-06-05 CN disclosed
US-10669377-B2 Polyimide solution, heat-resistant non-woven fabric, and method for manufacturing same TORAY INDUSTRIES, INC. (JP) 2020-06-02 US disclosed
US-20170342214-A1 POLYIMIDE SOLUTION, HEAT-RESISTANT NON-WOVEN FABRIC, AND METHOD FOR MANUFACTURING SAME TORAY INDUSTRIES, INC. (JP) 2017-11-30 US disclosed
EP-3216819-A1 POLYIMIDE SOLUTION, HEAT-RESISTANT NON-WOVEN FABRIC, AND METHOD FOR MANUFACTURING SAME Toray Industries, Inc. (JP) 2017-09-13 EP disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 US disclosed
EP-1909142-B1 PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION ENHANCER TORAY INDUSTRIES (JP) 2015-06-24 EP disclosed
US-8674029-B2 Method of preparing stabilized polymeric systems using polymeric peroxides Sunocs LLC (US) 2014-03-18 US disclosed
US-20120035307-A1 PROCESS FOR MAKING STABLIZED POLYMERIC SYSTEMS WITH NANOSTRUCTURES SONG CHENGQIAN (US) 2012-02-09 US disclosed
US-20120035315-A1 METHOD OF PREPARING STABLIZED POLYMERIC SYSTEMS USING POLYMERIC PEROXIDES SONG CHENGQIAN (US) 2012-02-09 US disclosed
US-20060208227-A1 Antioxidant and bisaminophenol derivative IDEMITSU LOSAN CO., LTD (JP) 2006-09-21 US disclosed
EP-1612254-A1 ANTIOXIDANT AND BISAMINOPHENOL DERIVATIVE IDEMITSU KOSAN COMPANY LIMITED (JP) 2006-01-04 EP disclosed
US-20050249961-A1 Polybenzazole precursor film, polybenzazole film and method of producing the same POLYMATECH CO., LTD. (JP) 2005-11-10 US disclosed
EP-1557440-A1 Article formed of polybenzazole and production method for the same Polymatech Co., Ltd. (JP) 2005-07-27 EP disclosed
US-20050156356-A1 Article formed of polybenzazole and production method for the same POLYMATECH CO., LTD 2005-07-21 US disclosed
CN-1537127-A Optical resin and use thereof �������ɹ�ҵ��ʽ���� 2004-10-13 CN disclosed
US-20040152862-A1 Optical resins and applications thereof HITACHI CHEMICAL CO., LTD. (JP) 2004-08-05 US disclosed
EP-1384743-A1 Polybenzazole precursor film, polybenzazole film and method of producing the same Polymatech Co., Ltd. (JP) 2004-01-28 EP disclosed
US-6372859-B1 MAKING A PASTE BY MIXING A SOLUTION OF HEAT-RESISTANT RESIN A IN A SOLVENT, FINE PARTICLES OF RESIN B INSOLUBLE IN THE SOLVENT BUT SOLUBLE UPON HEATING; HEATING TO DISSOLVE; COOLING TO DEPOSIT OR DISPERSE THE PARTICLES; CURING HITACHI CHEMICAL COMPANY, LTD. (JP) 2002-04-16 US disclosed
EP-0984051-A1 HEAT-RESISTANT ADHESIVES AND SEMICONDUCTOR DEVICES PRODUCED THEREWITH HITACHI CHEMICAL COMPANY, LTD. (JP) 2000-03-08 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI GAA 2033/4885TTR 3218/4885MMP2 4688/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.