Diphenylsulfane

Diphenylsulfane

SCHEMBL5651468

O=S(=O)(Oc1ccc(O)cc1)C(F)(F)C(F)(F)C1CC2CCC1C2.c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.33

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Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.33
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.33
LMNA P02545 1/20 0.33
ESR1 P03372 5/20 0.32
ESR2 Q92731 4/20 0.32
EPHX2 P34913 1/20 0.31
MGLL Q99685 1/20 0.31
NPC1 O15118 1/20 0.30
ALDH1A1 P00352 1/20 0.30
RAB9A P51151 1/20 0.30
STS P08842 1/20 0.30
SLC6A3 Q01959 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylsulfane SCHEMBL5651652 0.88 PIK3CD (0.37)
Diphenylsulfane SCHEMBL5648328 0.88 NPY2R (0.35) MAPTKMT2AMEN1NPC1ALDH1A1
Diphenylsulfane SCHEMBL5649246 0.85 MMP8 (0.31)
Diphenylsulfane SCHEMBL5649765 0.84 MMP8 (0.43) KMT2AMEN1
Diphenylsulfane SCHEMBL503656 0.76 STS (0.43) MAPTKMT2AMEN1LMNAESR2
Diphenylsulfane SCHEMBL2902245 0.74 PIK3CD (0.41) MAPTKMT2AMEN1LMNASTS
SCHEMBL5651472 0.73 ESR2 (0.32) ESR1ESR2ALDH1A1L3MBTL1
SCHEMBL3871094 0.71 L3MBTL1 (0.34) MAPTKMT2AALDH1A1SLC6A3L3MBTL1
SCHEMBL445083 0.71 SLC6A3 (0.32) LMNAEPHX2SLC6A3L3MBTL1
SCHEMBL445082 0.69 HPGD (0.36) KMT2AMEN1LMNAEPHX2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 US disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 US disclosed