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Diphenylsulfane

Diphenylsulfane

SCHEMBL5651652

O=S(=O)(Oc1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)cc1)C(F)(F)C(F)(F)C1CC2CCC1C2.c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.37

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Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ PIK3CD O00329 1/20 0.37
▸ PIK3CA P42336 1/20 0.37
▸ PIK3CB P42338 1/20 0.37
▸ CA1 P00915 2/20 0.32
▸ CA2 P00918 2/20 0.32
▸ AKR1C3 P42330 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diphenylsulfane SCHEMBL5651468 0.88 MAPT (0.33) —
Diphenylsulfane SCHEMBL5648328 0.87 NPY2R (0.35) —
Diphenylsulfane SCHEMBL5649246 0.84 MMP8 (0.31) —
Diphenylsulfane SCHEMBL5649765 0.83 MMP8 (0.43) —
Diphenylsulfane SCHEMBL1772327 0.82 PIK3CD (0.45) PIK3CDPIK3CAPIK3CBCA1CA2
SCHEMBL5651655 0.81 PIK3CD (0.32) PIK3CDPIK3CAPIK3CB
SCHEMBL2572784 0.80 STS (0.45) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL6501320 0.80 STS (0.45) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL4990263 0.77 PIK3CD (0.42) PIK3CDPIK3CAPIK3CBCA1CA2
Diphenylsulfane SCHEMBL192464 0.76 DRD2 (0.41) PIK3CDPIK3CAPIK3CBCA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7217492-B2 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2007-05-15 — — US disclosed
US-20050053861-A1 Onium salt compound and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-03-10 — — US disclosed