SCHEMBL5667341

SCHEMBL5667341

O=C(Cl)c1ccc(-c2ccc(C(=O)Cl)cc2C#Cc2cccc3ccccc23)c(C#Cc2cccc3ccccc23)c1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CHAT P28329 1/20 0.39
ACACB O00763 1/20 0.38
SLC16A3 O15427 2/20 0.37
GRM5 P41594 1/20 0.37
ALDH1A1 P00352 2/20 0.36
MAPT P10636 1/20 0.36
HPGD P15428 1/20 0.36
HDAC8 Q9BY41 1/20 0.36
HDAC6 Q9UBN7 1/20 0.36
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CYP1A2 P05177 2/20 0.35
CYP2C19 P33261 2/20 0.35
CYP2C9 P11712 1/20 0.35
NR4A1 P22736 1/20 0.34
NR4A2 P43354 1/20 0.34
NR4A3 Q92570 1/20 0.34
HRH3 Q9Y5N1 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL5667342 0.85 SLC16A3 (0.46) CHATSLC16A3NR4A1NR4A2NR4A3
SCHEMBL5669826 0.78 NPC1 (0.44) GRM5ALDH1A1MAPTHPGDCYP1A2
SCHEMBL28979636 0.76 NR4A1 (0.47) CHATACACBGRM5ALDH1A1MAPT
SCHEMBL3137844 0.73 HSD17B10 (0.52) SLC16A3ALDH1A1HPGDNR4A1NR4A2
SCHEMBL2776015 0.73 CHAT (0.60) CHATACACBGRM5ALDH1A1MAPT
SCHEMBL29661843 0.73 CHAT (0.60) CHATACACBGRM5ALDH1A1MAPT
SCHEMBL11148876 0.72 ALDH1A1 (0.55) ALDH1A1MAPTHPGDCYP1A2CYP2C19
SCHEMBL23909593 0.71 CA1 (0.45) ALDH1A1MAPTHPGDCA1CA2
SCHEMBL4847989 0.71 PTPN1 (0.42) ALDH1A1MAPTHPGDCA1CA2
SCHEMBL6364668 0.71 CHAT (0.58) CHATACACBGRM5ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1333050-B1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO (JP) 2006-12-27 EP disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed