SCHEMBL5674808

SCHEMBL5674808

CCc1cc(Cc2ccc(O)cc2O)c(O)c(Cc2ccc(O)cc2O)c1

nearest known ligand 0.60

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ ALOX5 P09917 3/20 0.53
▸ MEN1 O00255 2/20 0.50
▸ MAPT P10636 2/20 0.50
▸ KMT2A Q03164 2/20 0.50
▸ HSPA5 P11021 1/20 0.50
▸ TYR P14679 6/20 0.49
▸ TP53 P04637 1/20 0.46
▸ CYP3A4 P08684 1/20 0.46
▸ ALOX15 P16050 1/20 0.46
▸ TSHR P16473 1/20 0.46
▸ HTT P42858 1/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ AMY1A P0DUB6 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30374796 1.00 ALOX5 (0.53) ALOX5MEN1MAPTKMT2AHSPA5
SCHEMBL22500692 0.84 MAPT (0.53) ALOX5MEN1MAPTKMT2ATYR
SCHEMBL10445744 0.83 TYR (0.58) ALOX5MEN1MAPTKMT2ATYR
SCHEMBL4055018 0.82 TYR (0.64) ALOX5MEN1MAPTKMT2ATYR
SCHEMBL4055159 0.81 AMY1A (0.61) ALOX5MEN1MAPTKMT2AHSPA5
SCHEMBL4059100 0.81 AMY1A (0.61) ALOX5MEN1MAPTKMT2AHSPA5
SCHEMBL30703618 0.81 AMY1A (0.61) ALOX5MEN1MAPTKMT2AHSPA5
SCHEMBL4004589 0.81 AMY1A (0.61) ALOX5MEN1MAPTKMT2AHSPA5
SCHEMBL22500515 0.81 ESR1 (0.52) ALOX5MEN1MAPTKMT2AHSPA5
SCHEMBL51397 0.80 TYR (0.71) ALOX5MEN1MAPTKMT2AHSPA5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 — — EP claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 — — WO claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 — — US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 — — US claimed
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 — — EP disclosed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 — — WO disclosed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 — — US disclosed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 — — US disclosed
EP-1146394-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION CLARIANT INTERNATIONAL LTD. (CH) 2001-10-17 — — EP disclosed
US-6051358-A UNSYMETRICAL PHOTOACTIVE COMPOUND HAVING AT LEAST 2 DIAZOOXYNAPHTHALENESULFONYLOXY GROUPS SHIPLEY COMPANY, L.L.C. (US) 2000-04-18 — — US disclosed
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