Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 5/20 | 0.52 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.38 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | ANO1 | Q5XXA6 | 1/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2747443 | 0.79 | HSD11B1 (0.57) | HSD11B1EPHX2MEN1KMT2AP2RX7 | |
| SCHEMBL11122045 | 0.77 | EPHX2 (0.44) | HSD11B1EPHX2EPHX1 | |
| SCHEMBL22787488 | 0.76 | HSD11B1 (0.53) | HSD11B1EPHX2MAPK1KMT2A | |
| SCHEMBL31372014 | 0.75 | EPHX2 (0.40) | HSD11B1EPHX2ANO1P2RX7 | |
| SCHEMBL17317565 | 0.75 | CHRNB2 (0.45) | EPHX2NR1H2CYP2C9MEN1KMT2A | |
| SCHEMBL26871236 | 0.74 | EPHX2 (0.35) | EPHX2NR1H2MEN1MAPK1KMT2A | |
| SCHEMBL12732747 | 0.74 | MEN1 (0.45) | EPHX2MEN1KMT2A | |
| SCHEMBL19325376 | 0.73 | HSD11B1 (0.42) | HSD11B1EPHX2ANO1EPHX1 | |
| SCHEMBL23080555 | 0.73 | EPHX2 (0.32) | EPHX2 | |
| SCHEMBL702226 | 0.72 | EPHX2 (0.40) | HSD11B1EPHX2NR1H2MEN1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1441256-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-0789278-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-05-04 | — | — | EP | disclosed |
| US-20050019692-A1 | Resist material and method for pattern formation | KUBOTA HIROSHI (JP) | 2005-01-27 | — | — | US | disclosed |
| EP-1441256-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2004-07-28 | — | — | EP | disclosed |
| US-6727032-B1 | USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. | JSR CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| US-6692887-B1 | COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY | JSR CORPORATION (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20010055727-A1 | Resist material and method for pattern formation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-12-27 | — | — | US | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |