SCHEMBL5698405

SCHEMBL5698405

O=S(=O)(O)Cl.[N-]=[N+]=C1CC(=O)c2ccccc2C1=O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
CDC25B P30305 1/20 0.34
APAF1 O14727 2/20 0.34
TDP2 O95551 2/20 0.34
IDO1 P14902 1/20 0.34
DNMT1 P26358 1/20 0.34
DNMT3L Q9UJW3 1/20 0.34
DNMT3A Q9Y6K1 1/20 0.34
BCHE P06276 2/20 0.34
CES1 P23141 2/20 0.34
MAPT P10636 4/20 0.33
MAOA P21397 3/20 0.33
S100A4 P26447 3/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
PGAM1 P18669 1/20 0.33
KDM4E B2RXH2 1/20 0.33
CES2 O00748 1/20 0.33
TERT O14746 1/20 0.33
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4895477 0.93 MEN1 (0.37) MEN1KMT2ACDC25BAPAF1TDP2
Sulfuric Acid SCHEMBL3680446 0.93 MEN1 (0.37) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL26761 0.90 MEN1 (0.42) MEN1KMT2ACDC25BAPAF1TDP2
Hydrochloric Acid SCHEMBL7597249 0.88 MEN1 (0.41) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL29530894 0.88 MEN1 (0.41) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL8605108 0.86 TSHR (0.47) MEN1KMT2ACDC25BAPAF1TDP2
Phenol SCHEMBL28798223 0.84 APAF1 (0.38) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL3273520 0.83 MEN1 (0.37) MEN1KMT2ACDC25BAPAF1TDP2
Naphthoquinone SCHEMBL28299526 0.82 IDO1 (0.47) MEN1KMT2ACDC25BAPAF1TDP2
Benzophenone SCHEMBL28692346 0.81 ALDH1A1 (0.42) MEN1KMT2ACDC25BAPAF1TDP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1674929-A1 Method for producing a photoresist solution AZ Electronic Materials (Germany) GmbH (DE) 2006-06-28 EP claimed
JP-2006209099-A METHOD FOR PRODUCING PHOTORESIST SOLUTION AZ ELECTRONIC MATERIALS (GERMANY) GMBH 2006-08-10 JP disclosed
EP-1674929-A1 Method for producing a photoresist solution AZ Electronic Materials (Germany) GmbH (DE) 2006-06-28 EP disclosed
EP-1674929-A1 Method for producing a photoresist solution AZ Electronic Materials (Germany) GmbH (DE) 2006-06-28 EP disclosed