Sulfuric Acid

Sulfuric Acid

SCHEMBL3680446

O=S(=O)(O)O.[N-]=[N+]=C1CC(=O)c2ccccc2C1=O

nearest known ligand 0.38

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA known ✓ P21397 3/20 0.35
PKLR known ✓ P30613 1/20 0.33
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
CDC25B P30305 1/20 0.37
APAF1 O14727 2/20 0.36
TDP2 O95551 2/20 0.36
BCHE P06276 2/20 0.36
CES1 P23141 2/20 0.36
MAPT P10636 4/20 0.35
S100A4 P26447 3/20 0.35
KDM4E B2RXH2 3/20 0.35
MAPK1 P28482 2/20 0.35
CES2 O00748 1/20 0.35
TERT O14746 1/20 0.35
NPC1 O15118 1/20 0.35
PLIN1 O60240 1/20 0.35
S1PR4 O95977 1/20 0.35
LMNA P02545 1/20 0.35
PLA2G1B P04054 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5698405 0.93 MEN1 (0.34) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL26761 0.93 MEN1 (0.42) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL29530894 0.91 MEN1 (0.41) MEN1KMT2ACDC25BAPAF1TDP2
Hydrochloric Acid SCHEMBL7597249 0.91 MEN1 (0.41) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL4895477 0.90 MEN1 (0.37) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL8605108 0.89 TSHR (0.47) MEN1KMT2ACDC25BAPAF1TDP2
Phenol SCHEMBL28798223 0.87 APAF1 (0.38) MEN1KMT2ACDC25BAPAF1TDP2
SCHEMBL3273520 0.86 MEN1 (0.37) MEN1KMT2ACDC25BAPAF1TDP2
Naphthoquinone SCHEMBL28299526 0.85 IDO1 (0.47) MEN1KMT2ACDC25BAPAF1TDP2
Benzophenone SCHEMBL28692346 0.84 ALDH1A1 (0.42) MEN1KMT2ACDC25BAPAF1TDP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130189622-A1 BLOCK COPOLYMER OF POLYMIDE AND POLYAMIC ACID, METHOD FOR PRODUCING THE BLOCK COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE BLOCK COPOLYMER AND PROTECTIVE FILM FORMED USING THE BLOCK COPOLYMER LG CHEM, LTD. (KR) 2013-07-25 US disclosed
US-20100069520-A1 Block copolymer of polyimide and polyamic acid, method for producing the block copolymer, photosensitive resin composition comprising the block copolymer and protective film formed using the block copolymer LG CHEM, LTD. (KR) 2010-03-18 US disclosed