SCHEMBL5709656

SCHEMBL5709656

Cc1ccc(S(=O)(=O)Oc2ccc(S(=O)(=O)OS(c3ccc(OC(C)(C)C)cc3)(c3ccc(OC(C)(C)C)cc3)c3ccc(OC(C)(C)C)cc3)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 4/20 0.44
ENPP3 O14638 3/20 0.44
ENPP1 P22413 3/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
CA2 P00918 3/20 0.42
ALDH1A1 P00352 3/20 0.42
CA12 O43570 2/20 0.42
MAPT P10636 2/20 0.42
HTT P42858 1/20 0.42
PPARG P37231 1/20 0.42
LMNA P02545 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
CA1 P00915 1/20 0.40
CA9 Q16790 1/20 0.40
CYP3A4 P08684 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
CYP2C19 P33261 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482368 0.95 TDP1 (0.46) ENPP2ENPP3ENPP1MEN1KMT2A
SCHEMBL8496289 0.94 BCHE (0.43) ENPP2ENPP3ENPP1MEN1KMT2A
SCHEMBL64968 0.94 BCHE (0.43) ENPP2ENPP3ENPP1MEN1KMT2A
SCHEMBL5709627 0.89 MEN1 (0.51) ENPP2ENPP3ENPP1MEN1KMT2A
SCHEMBL64770 0.89 HTT (0.45) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL8494335 0.89 ALDH1A1 (0.46) MEN1KMT2AALDH1A1MAPTLMNA
SCHEMBL65270 0.89 HTT (0.45) MEN1KMT2ACA2ALDH1A1CA12
SCHEMBL5709666 0.86 MEN1 (0.54) ENPP2ENPP3ENPP1MEN1KMT2A
SCHEMBL6741024 0.86 MEN1 (0.49) ENPP2MEN1KMT2ACA2ALDH1A1
SCHEMBL6140117 0.85 ALDH1A1 (0.43) MEN1KMT2AALDH1A1MAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1077391-B1 Onium salts, photoacid generators for resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2006-09-27 EP disclosed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed