SCHEMBL5709679

SCHEMBL5709679

CC(C)(C)Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=S(=O)([O-])c1ccccc1OS(=O)(=O)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.40
HSD17B3 P37058 1/20 0.40
ALDH1A1 P00352 3/20 0.38
LMNA P02545 4/20 0.38
HTT P42858 2/20 0.38
MAPT P10636 3/20 0.37
TDP1 Q9NUW8 3/20 0.37
L3MBTL1 Q9Y468 2/20 0.34
METAP2 P50579 1/20 0.34
METAP1 P53582 1/20 0.34
HTR6 P50406 2/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
ESR1 P03372 1/20 0.34
GAA P10253 1/20 0.34
ESR2 Q92731 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
KEAP1 Q14145 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6744748 0.87 MEN1 (0.48) HSD11B1HSD17B3ALDH1A1LMNAHTT
SCHEMBL2900930 0.86 PPARA (0.37) HSD11B1ALDH1A1LMNAHTTMAPT
SCHEMBL6740041 0.86 MEN1 (0.39) HSD11B1HSD17B3ALDH1A1LMNAHTT
SCHEMBL6745165 0.84 KMT2A (0.44) HSD11B1HSD17B3ALDH1A1LMNAHTT
SCHEMBL384726 0.83 ALDH1A1 (0.40) ALDH1A1LMNAHTTMAPTTDP1
SCHEMBL6743186 0.82 KMT2A (0.41) ALDH1A1LMNAHTTMAPTTDP1
SCHEMBL7112619 0.81 ALDH1A1 (0.45) ALDH1A1LMNAHTTMAPTTDP1
SCHEMBL8316981 0.80 PPARA (0.33) ALDH1A1LMNAHTTMEN1KMT2A
SCHEMBL8320141 0.80 PPARA (0.33) ALDH1A1LMNAHTTMEN1KMT2A
SCHEMBL65269 0.80 HTT (0.44) ALDH1A1LMNAHTTTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1077391-B1 Onium salts, photoacid generators for resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2006-09-27 EP disclosed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed