SCHEMBL57280

SCHEMBL57280

C/C(=C\C=C(\C=C(/C)C(=O)O)c1ccccc1)C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.46
CYP2C9 P11712 1/20 0.44
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
PARP1 P09874 1/20 0.41
PARP15 Q460N3 1/20 0.41
PARP10 Q53GL7 1/20 0.41
CES2 O00748 3/20 0.41
CES1 P23141 3/20 0.41
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
ALDH1A1 P00352 5/20 0.39
LMNA P02545 1/20 0.39
HTT P42858 1/20 0.39
NFE2L2 Q16236 1/20 0.38
DAO P14920 1/20 0.37
TSHR P16473 1/20 0.37
NAPRT Q6XQN6 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28337501 1.00 AKR1C3 (0.46) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL28097679 0.80 AKR1C3 (0.63) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL10397770 0.79 AKR1C3 (0.50) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL4450282 0.79 AKR1C3 (0.50) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL10397769 0.79 AKR1C3 (0.50) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL5566136 0.78 AKR1C3 (0.54) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL8104632 0.76 NFE2L2 (0.59) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL2791186 0.76 NFE2L2 (0.59) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL3386465 0.75 AKR1C3 (0.50) AKR1C3CYP2C9CA12CA1CA2
SCHEMBL12657652 0.75 AKR1C3 (0.50) AKR1C3CYP2C9CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5298327-A Transparent,solid, flexible, impurity-free thermoset polymer; communications LUMENYTE INTERNATIONAL CORPORATION (US) 1994-03-29 US claimed
US-4323636-A THERMOPLASTIC AND ELASTOMERIC IN CONJUNCTION WITH AN ACRYLATE COMPOUND E. I. DU PONT DE NEMOURS AND COMPANY (US) 1982-04-06 US claimed
US-20240210827-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-06-27 US disclosed
US-20230180744-A1 PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF INSTITUT NATIONAL DES SCIENCES ET INDUSTRIES DU VIVANT ET DE L'ENVIRONNEMENT (FR) 2023-06-15 US disclosed
CN-109983595-B Composition for organic electronic device encapsulant and encapsulant formed using the same 莫门蒂夫性能材料韩国株式会社 2023-04-04 CN disclosed
CN-109791978-B Composition for organic electronic element encapsulant and encapsulant formed using the same 莫门蒂夫性能材料韩国株式会社 2023-04-04 CN disclosed
EP-3522241-B1 COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED USING SAME MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) 2023-03-22 EP disclosed
EP-4136175-A1 PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF Commissariat à l'énergie atomique et aux énergies alternatives (FR) 2023-02-22 EP disclosed
CN-115185157-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2022-10-14 CN disclosed
CN-110032042-B Negative photoresist composition for laser ablation and method of use thereof 默克专利有限公司 2022-05-27 CN disclosed
EP-3553840-B1 COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT AND ENCAPSULANT FORMED USING SAME MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) 2022-01-05 EP disclosed
EP-0076028-A2 Aqueous processible, alcohol resistant flexographic printing plates E.I. DU PONT DE NEMOURS AND COMPANY (US) 1983-04-06 EP disclosed
US-4361640-A ADDITION-CONDENSATION COPOLYMER; PRINTING PLATES E. I. DU PONT DE NEMOURS AND COMPANY (US) 1982-11-30 US disclosed
EP-0064564-A1 Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers E.I. DU PONT DE NEMOURS AND COMPANY (US) 1982-11-17 EP disclosed
EP-0064565-A1 Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates E.I. DU PONT DE NEMOURS AND COMPANY (US) 1982-11-17 EP disclosed
EP-0058737-A1 Flexographic printing plates containing blended adhesives E.I. DU PONT DE NEMOURS AND COMPANY (US) 1982-09-01 EP disclosed
US-4272608-A CARBOXYLATED BUTADIENE-ACRYLONITRILE COPOLYMER, AN ETHYLENICALLY UNSATURATED COMPOUND, AND A FREE RADICAL GENERATING SYSTEM E. I. DU PONT DE NEMOURS AND COMPANY (US) 1981-06-09 US disclosed
US-4257915-A USE IN PHOTOPOLYMERIZATION OF ETHYLENICALLY UNSATURATED MONOMERS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1981-03-24 US disclosed
US-4177074-A HIGH AND LOW MOLECULAR WEIGHT POLYMERS CONTAINING CARBOXYL GROUPS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1979-12-04 US disclosed
US-4127436-A PHOTORESIST E. I. DU PONT DE NEMOURS AND COMPANY (US) 1978-11-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230180744-A1 PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF PCNA, LPO, CUTA AKR1C3 3762/4885CYP2C9 2358/4885CA12 4671/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.