Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CETP | P11597 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21312127 | 0.85 | TSHR (0.30) | — | |
| SCHEMBL31011051 | 0.79 | CETP (0.32) | CETP | |
| SCHEMBL12219513 | 0.79 | TSHR (0.33) | CETP | |
| SCHEMBL440846 | 0.79 | TSHR (0.33) | CETP | |
| SCHEMBL14663990 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL12219511 | 0.79 | TSHR (0.33) | CETP | |
| Methyl Alcohol SCHEMBL27427612 | 0.77 | CETP (0.35) | CETP | |
| SCHEMBL2852867 | 0.76 | CETP (0.39) | CETP | |
| SCHEMBL2262667 | 0.76 | CETP (0.39) | CETP | |
| SCHEMBL199 | 0.76 | CETP (0.39) | CETP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120141817-A1 | THIN METAL NANOWIRES PRODUCED BY BIOTEMPLATING | MOROZOVA-ROCHE LUDMILLA (SE) | 2012-06-07 | — | — | US | claimed |
| EP-2132013-B1 | METHOD FOR THE MANUFACTURE OF THIN METAL NANOWIRES BY BIOTEMPLATING | MOROZOVA-ROCHE LUDMILLA (SE) | 2012-02-08 | — | — | EP | claimed |
| EP-2132013-A1 | THIN METAL NANOWIRES PRODUCED BY BIOTEMPLATING | Morozova-Roche, Ludmilla (SE) | 2009-12-16 | — | — | EP | claimed |
| WO-2008118094-A1 | THIN METAL NANOWIRES PRODUCED BY BIOTEMPLATING | MOROZOVA-ROCHE LUDMILLA (SE) | 2008-10-02 | — | — | WO | claimed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-11784348-B2 | Electrolytes for magnesium-ion batteries | THE TRUSTEES OF PRINCETON UNIVERSITY (US) | 2023-10-10 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305395-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230161256-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161243-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230146890-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-11 | — | — | US | disclosed |
| US-20120141817-A1 | THIN METAL NANOWIRES PRODUCED BY BIOTEMPLATING | MOROZOVA-ROCHE LUDMILLA (SE) | 2012-06-07 | — | — | US | disclosed |
| EP-2132013-B1 | METHOD FOR THE MANUFACTURE OF THIN METAL NANOWIRES BY BIOTEMPLATING | MOROZOVA-ROCHE LUDMILLA (SE) | 2012-02-08 | — | — | EP | disclosed |
| EP-2132013-A1 | THIN METAL NANOWIRES PRODUCED BY BIOTEMPLATING | Morozova-Roche, Ludmilla (SE) | 2009-12-16 | — | — | EP | disclosed |
| WO-2008118094-A1 | THIN METAL NANOWIRES PRODUCED BY BIOTEMPLATING | MOROZOVA-ROCHE LUDMILLA (SE) | 2008-10-02 | — | — | WO | disclosed |
| US-7402626-B2 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-07-22 | — | — | US | disclosed |
| US-7402626-B2 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20070105044-A1 | Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-05-10 | — | — | US | disclosed |
| US-20070105044-A1 | Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-05-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | CETP 4852/4885 |
| US-20230161243-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, ASIC1, REN | CETP 4080/4885 |
| US-20230146890-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, ASIC1, REN | CETP 4080/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | CETP 4154/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.