Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 4/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | PGR | P06401 | 1/20 | 0.44 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.44 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.44 |
| ▸ | HTR2A | P28223 | 1/20 | 0.44 |
| ▸ | HRH1 | P35367 | 1/20 | 0.44 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | SRC | P12931 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10946333 | 0.93 | CES2 (0.50) | CES1ALDH1A1HPGDCES2MAPT | |
| SCHEMBL10943108 | 0.93 | ALDH1A1 (0.56) | ALDH1A1HPGD | |
| SCHEMBL10384789 | 0.87 | CES1 (0.44) | CES1CES2POLBSRCCYP1A2 | |
| Hydrochloric Acid SCHEMBL19305010 | 0.85 | MLYCD (0.42) | CES1CES2POLBSRCCYP1A2 | |
| SCHEMBL10947586 | 0.85 | HPGD (0.44) | ALDH1A1HPGDMAPT | |
| SCHEMBL9315354 | 0.84 | CES1 (0.46) | CES1ALDH1A1HPGDCES2 | |
| SCHEMBL10103988 | 0.83 | CA2 (0.46) | CES1ALDH1A1HPGDCES2MAPT | |
| SCHEMBL10384831 | 0.83 | CYP1A2 (0.44) | CES1ALDH1A1HPGDPGRADRA2A | |
| SCHEMBL10384361 | 0.81 | MLYCD (0.45) | CES1ALDH1A1CES2RIPK1 | |
| SCHEMBL14156783 | 0.81 | KMT2A (0.51) | RIPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2585431-B1 | METAL FREE BLEACHING COMPOSITION | BASF SE (DE) | 2017-09-06 | — | — | EP | claimed |
| US-8338500-B2 | Binder composition and photosensitive composition including the same | HON HAI PRECISION INDUSTRY CO., LTD. (TW) | 2012-12-25 | — | — | US | claimed |
| US-20100148134-A1 | Binder composition and photosensitive composition including the same | HON HAI PRECISION INDUSTRY CO., LTD. (TW) | 2010-06-17 | — | — | US | claimed |
| US-20080180503-A1 | INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | FUJIFILM CORPORATION (JP) | 2008-07-31 | — | — | US | claimed |
| US-20080176169-A1 | BINDER COMPOSITION AND PHOTOSENSITIVE COMPOSITION INCLUDING THE SAME | ICF TECHNOLOGY LIMITED. (US) | 2008-07-24 | — | — | US | claimed |
| WO-2025057864-A1 | ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME | ＴＯＰＰＡＮホールディングス株式会社 | 2025-03-20 | — | — | WO | disclosed |
| US-12210285-B2 | Resin composition, resin sheet, cured film, method for producing cured film, semiconductor device, and display device | TORAY INDUSTRIES, INC. (JP) | 2025-01-28 | — | — | US | disclosed |
| US-20240317942-A1 | THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION | RESONAC CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| EP-4375302-A1 | THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION | Resonac Corporation (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-111538209-B | Photosensitive resin composition, organic EL element partition wall, and organic EL element | 日保丽公司 | 2024-05-14 | — | — | CN | disclosed |
| CN-117882497-A | Adhesive film for circuit connection, circuit connection structure, and method for producing same | 株式会社力森诺科 | 2024-04-12 | — | — | CN | disclosed |
| CN-117651722-A | Thiol-containing composition, photocurable composition, and thermosetting composition | 株式会社力森诺科 | 2024-03-05 | — | — | CN | disclosed |
| US-4992547-A | Aminoaryl ketone photoinitiators | CIBA-GEIGY CORPORATION (US) | 1991-02-12 | — | — | US | disclosed |
| US-4960746-A | A-HYDROXY-OR A-AMINO-ACETOPHENONES AND A TITANOCENE COMPOUND SUBSTITUTED BY FLUORINE | CIBA-GEIGY CORPORATION (US) | 1990-10-02 | — | — | US | disclosed |
| EP-0003002-B1 | USE OF AROMATIC-ALIPHATIC KETONES AS PHOTOINITIATORS, PHOTOPOLYMERISABLE SYSTEMS CONTAINING SUCH KETONES AND AROMATIC-ALIPHATIC KETONES | CIBA-GEIGY AG (CH) | 1984-06-13 | — | — | EP | disclosed |
| US-4321118-A | Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition | CIBA-GEIGY CORPORATION (US) | 1982-03-23 | — | — | US | disclosed |
| US-4318791-A | PHOTOPOLYMERIZABLE SYSTEM FOR INKS | CIBA-GEIGY CORPORATION (US) | 1982-03-09 | — | — | US | disclosed |
| US-4315807-A | Sensitizers for photopolymerization | CIBA-GEIGY CORPORATION (US) | 1982-02-16 | — | — | US | disclosed |
| US-4308400-A | AROMATIC HYDROXY KETONES | CIBA-GEIGY A.G. (CH) | 1981-12-29 | — | — | US | disclosed |
| EP-0003002-A2 | Use of aromatic-aliphatic ketones as photoinitiators, photopolymerisable systems containing such ketones and aromatic-aliphatic ketones | CIBA-GEIGY AG (CH) | 1979-07-11 | — | — | EP | disclosed |