SCHEMBL582333

SCHEMBL582333

[C]1Cc2c(ccc3ccccc23)N1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.41
ALDH1A1 P00352 3/20 0.41
CYP2A6 P11509 1/20 0.41
TSHR P16473 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
HPRT1 P00492 1/20 0.38
HIF1A Q16665 1/20 0.35
CYP1B1 Q16678 1/20 0.35
KDM4E B2RXH2 3/20 0.35
CYP1A2 P05177 2/20 0.35
HPGD P15428 2/20 0.35
CYP2C19 P33261 2/20 0.35
GLA P06280 1/20 0.35
CYP2C9 P11712 1/20 0.35
SIRT1 Q96EB6 1/20 0.35
HTT P42858 1/20 0.35
CDK5 Q00535 1/20 0.35
CDK5R1 Q15078 1/20 0.35
NCOA1 Q15788 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL687396 0.70 ALDH1A1 (0.38) HSD17B10ALDH1A1CYP2A6TSHRTDP1
SCHEMBL1159909 0.68 HSD17B10 (0.44) HSD17B10ALDH1A1CYP2A6TSHRTDP1
SCHEMBL2705341 0.68 ALDH1A1 (0.39) HSD17B10ALDH1A1CYP2A6TSHRTDP1
Bromide SCHEMBL5406141 0.65 NOTUM (0.44) HSD17B10ALDH1A1CYP2A6TSHRTDP1
Iodide SCHEMBL5402073 0.65 NOTUM (0.44) HSD17B10ALDH1A1CYP2A6TSHRTDP1
SCHEMBL25366218 0.65 LMNA (0.44) HSD17B10ALDH1A1CYP2A6TSHRTDP1
SCHEMBL31712962 0.65 HSD17B10 (0.41) HSD17B10ALDH1A1CYP2A6TSHRTDP1
Hydrochloric Acid SCHEMBL8013061 0.65 NOTUM (0.44) HSD17B10ALDH1A1CYP2A6TSHRTDP1
Bromide SCHEMBL8014734 0.65 NOTUM (0.44) HSD17B10ALDH1A1CYP2A6TSHRTDP1
Hydrochloric Acid SCHEMBL5396075 0.65 NOTUM (0.44) HSD17B10ALDH1A1CYP2A6TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP claimed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US claimed
EP-0568993-A2 Chemical amplification resist composition KYOWA HAKKO KOGYO CO., LTD. (JP) 1993-11-10 EP claimed
JP-6043633-A None JP disclosed
EP-1768853-B1 OPTICAL RECORDING MEDIUM, RECORDING AND REPRODUCING METHOD THEREOF, AND OPTICAL RECORDING APPARATUS RICOH CO LTD (JP) 2012-02-15 EP disclosed
US-7710855-B2 Optical recording medium, recording and reproducing method thereof, and optical recording apparatus RICOH COMPANY, LTD. (JP) 2010-05-04 US disclosed
EP-1267338-B1 Optical recording medium, optical recording method and optical recording device RICOH KK (JP) 2010-04-07 EP disclosed
US-20090135706-A1 Optical recording medium, and optical recording method and optical recording apparatus thereof KYOWA HAKKO CHEMICAL CO., LTD. (JP) 2009-05-28 US disclosed
US-20080316890-A1 Optical Recording Medium, Recording and Reproducing Method Thereof, and Optical Recording Apparatus RICOH COMPANY, LTD. (JP) 2008-12-25 US disclosed
EP-1449890-B1 Squarylium-metal chelate compounds and optical recording media RICOH KK (JP) 2007-09-19 EP disclosed
US-7223521-B2 Squarylium-metal chelate compounds and optical recording media RICOH COMPANY, LTD. (JP) 2007-05-29 US disclosed
US-6737143-B2 HAVING RELIABILITY, HIGH REFLECTIVITY AND LOW JITTER RICOH COMPANY LTD. (JP) 2004-05-18 US disclosed
US-20030206514-A1 Optical recording medium, optical recording method and optical recording device KYOWA YUKA CO., LTD. (JP) 2003-11-06 US disclosed
US-20030157291-A1 Optical recording medium, optical recording method and optical recording device RICOH COMPANY, LTD. 2003-08-21 US disclosed
EP-1267338-A2 Optical recording medium, optical recording method and optical recording device Ricoh Company, Ltd. (JP) 2002-12-18 EP disclosed
EP-0568993-B1 Chemical amplification resist composition KYOWA HAKKO KOGYO KK (JP) 1998-08-12 EP disclosed
US-5527659-A PHOTOSENSITIVITY KYOWA HAKKO KOGYO CO., LTD. (JP) 1996-06-18 US disclosed
JP-H0643633-A CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION KYOWA HAKKO KOGYO CO LTD 1994-02-18 JP disclosed
EP-0568993-A2 Chemical amplification resist composition KYOWA HAKKO KOGYO CO., LTD. (JP) 1993-11-10 EP disclosed
JP-H00643633-A 0001-01-01 JP disclosed