Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | BRD4 | O60885 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | GPR3 | P46089 | 2/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.34 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 3/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5827883 | 0.80 | CA1 (0.52) | CA1CA2KMT2APTGS1PTGS2 | |
| Trifluoromethanesulfonic Acid SCHEMBL5828289 | 0.79 | ACHE (0.44) | GPR3PTGS1PTGS2ALDH1A1KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL5828707 | 0.77 | BRD4 (0.35) | CA1CA2BRD4KMT2AGPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL5828425 | 0.74 | KCNH2 (0.44) | CA1CA2GPR3PTGS1CYP3A4 | |
| Trifluoromethanesulfonic Acid SCHEMBL5858662 | 0.73 | ESR1 (0.37) | CA1CA2BRD4KMT2AGPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL31447261 | 0.73 | GABRA1 (0.34) | GPR3ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL31049632 | 0.72 | PTGS1 (0.44) | CA1CA2BRD4KMT2AGPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL3286719 | 0.72 | GPR3 (0.34) | CA1CA2BRD4KMT2AGPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL36229 | 0.72 | BRD4 (0.32) | CA1CA2BRD4KMT2AGPR3 | |
| Trifluoromethanesulfonic Acid SCHEMBL2903904 | 0.71 | TDP1 (0.44) | KMT2AGPR3PTGS1PTGS2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6991888-B2 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-01-31 | — | — | US | disclosed |
| EP-1516229-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2005-03-23 | — | — | EP | disclosed |
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | MERCK PATENT GMBH (DE) | 2003-12-25 | — | — | US | disclosed |
| US-20030235775-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-25 | — | — | US | disclosed |
| WO-2003107093-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | SUN2, UROD, ERCC1 | CA1 458/4885CA2 312/4885BRD4 1633/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.