Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 3/20 | 0.47 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.47 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.43 |
| ▸ | ACHE | P22303 | 7/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.41 |
| ▸ | CA1 | P00915 | 3/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | MMP1 | P03956 | 1/20 | 0.41 |
| ▸ | MMP2 | P08253 | 1/20 | 0.41 |
| ▸ | MMP9 | P14780 | 1/20 | 0.41 |
| ▸ | MMP8 | P22894 | 1/20 | 0.41 |
| ▸ | MMP13 | P45452 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | PKLR | P30613 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA7 | P43166 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1592826 | 0.89 | PKM (0.47) | PKMKCNH2HSD11B1ACHEGAA | |
| Trifluoromethanesulfonic Acid SCHEMBL361656 | 0.83 | KCNH2 (0.46) | PKMKCNH2HSD11B1ACHEGAA | |
| SCHEMBL5828549 | 0.80 | CA1 (0.61) | PKMACHEGAACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL30631665 | 0.79 | KCNH2 (0.48) | PKMKCNH2HSD11B1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL454992 | 0.79 | PKM (0.47) | PKMKCNH2HSD11B1ACHEGAA | |
| Trifluoromethanesulfonic Acid SCHEMBL5828425 | 0.78 | KCNH2 (0.44) | PKMKCNH2ACHEGAACA1 | |
| Trifluoromethanesulfonic Acid SCHEMBL5146818 | 0.77 | KCNH2 (0.46) | PKMKCNH2HSD11B1ACHEGAA | |
| Trifluoromethanesulfonic Acid SCHEMBL8373803 | 0.76 | KCNH2 (0.45) | PKMKCNH2HSD11B1ACHEGAA | |
| Trifluoromethanesulfonic Acid SCHEMBL30631664 | 0.76 | KEAP1 (0.44) | KCNH2GAAMMP1MMP9MMP13 | |
| Trifluoromethanesulfonic Acid SCHEMBL5774894 | 0.76 | KDM4E (0.49) | CA1CA2MMP2MMP8MMP13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6991888-B2 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-01-31 | — | — | US | disclosed |
| EP-1516229-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2005-03-23 | — | — | EP | disclosed |
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | MERCK PATENT GMBH (DE) | 2003-12-25 | — | — | US | disclosed |
| US-20030235775-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-25 | — | — | US | disclosed |
| WO-2003107093-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-24 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | SUN2, UROD, ERCC1 | PKM 3037/4885KCNH2 1940/4885HSD11B1 3814/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.