Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.40 |
| ▸ | EDNRA | P25101 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | GPR3 | P46089 | 1/20 | 0.39 |
| ▸ | LTA4H | P09960 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1592826 | 0.94 | PKM (0.47) | KCNH2GAAKMT2APKMACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL756610 | 0.88 | EDNRA (0.43) | ALDH1A1GAAKMT2AHTTPKM | |
| SCHEMBL7574610 | 0.87 | ALDH1A1 (0.47) | ALDH1A1HTTPKMKEAP1CA4 | |
| SCHEMBL1804138 | 0.86 | ALDH1A1 (0.38) | KCNH2ALDH1A1GAAKMT2AHTT | |
| Trifluoromethanesulfonic Acid SCHEMBL30631664 | 0.85 | KEAP1 (0.44) | KCNH2ALDH1A1GAAKMT2AKEAP1 | |
| SCHEMBL1800746 | 0.85 | ALDH1A1 (0.37) | KCNH2ALDH1A1GAAKMT2AHTT | |
| Trifluoromethanesulfonic Acid SCHEMBL64774 | 0.85 | GPR3 (0.37) | KCNH2ALDH1A1KMT2AACHEKEAP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL36177 | 0.85 | GPR3 (0.50) | KCNH2ALDH1A1ACHEHSD11B1GPR3 | |
| SCHEMBL7582832 | 0.84 | ALDH1A1 (0.49) | ALDH1A1HTTPKMCA4KDM4E | |
| Trifluoromethanesulfonic Acid SCHEMBL5828338 | 0.83 | PKM (0.47) | KCNH2GAAKMT2APKMACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 969 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-114874384-A | 193nm photoresist film-forming resin, preparation method thereof and positive photoresist composition | 南通林格橡塑制品有限公司 | 2022-08-09 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114721221-A | 193nm molecular glass photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-07-08 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| WO-2012177122-A1 | COMPOSITION TO PROTECT SURFACES AND ITS COATING METHOD | HOLLAND NOVOCHEM TECHNICAL COATINGS B.V. (NL) | 2012-12-27 | — | — | WO | claimed |
| US-20100078598-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| EP-2031007-A2 | Norbornene-type polymers, compositions thereof and lithographic processes using such compositions | Promerus LLC (US) | 2009-03-04 | — | — | EP | claimed |
| WO-2008091135-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2008-07-31 | — | — | WO | claimed |
| EP-1853972-A2 | NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS | Promerus LLC (US) | 2007-11-14 | — | — | EP | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| EP-0249139-B2 | Resist compositions and use | MICROSI INC (US) | 1998-03-11 | — | — | EP | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |
| EP-0284868-B1 | Photoresist compositions | MICROSI INC (US) | 1995-05-03 | — | — | EP | claimed |
| US-4968581-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-11-06 | — | — | US | claimed |
| US-4912018-A | High resolution photoresist based on imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| US-4837124-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1989-06-06 | — | — | US | claimed |
| EP-0284868-A2 | Photoresist compositions | MicroSi, Inc. (a Delaware corporation) (US) | 1988-10-05 | — | — | EP | claimed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | claimed |