SCHEMBL5833342

SCHEMBL5833342

O=C(O)C1CC2C=CC1CC2

nearest known ligand 0.48

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.48
TDP1 Q9NUW8 2/20 0.48
APEX1 P27695 1/20 0.48
KDM4E B2RXH2 1/20 0.42
LMNA P02545 1/20 0.42
GABRR1 P24046 5/20 0.36
SLC1A2 P43004 4/20 0.33
SLC1A1 P43005 3/20 0.33
GRM2 Q14416 1/20 0.31
GABRR2 P28476 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22361971 1.00 POLB (0.48) POLBTDP1APEX1KDM4ELMNA
SCHEMBL20548051 1.00 POLB (0.48) POLBTDP1APEX1KDM4ELMNA
SCHEMBL2206146 0.86 KDM4E (0.39) POLBTDP1APEX1KDM4ELMNA
SCHEMBL8996504 0.83 KDM4E (0.42) POLBTDP1APEX1KDM4ELMNA
SCHEMBL6811019 0.83 KDM4E (0.42) POLBTDP1APEX1KDM4ELMNA
SCHEMBL24004713 0.82 KDM4E (0.61) POLBTDP1APEX1KDM4ELMNA
SCHEMBL21705290 0.82 KDM4E (0.61) POLBTDP1APEX1KDM4ELMNA
SCHEMBL900095 0.82 KDM4E (0.61) POLBTDP1APEX1KDM4ELMNA
SCHEMBL16898630 0.82 KDM4E (0.61) POLBTDP1APEX1KDM4ELMNA
SCHEMBL6161898 0.82 KDM4E (0.61) POLBTDP1APEX1KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0790974-B1 SUBSTITUTED 4-BIARYLBUTYRIC OR 5-BIARYLPENTANOIC ACIDS AND DERIVATIVES AS MATRIX METALLOPROTEASE INHIBITIORS BAYER AG (US) 2002-08-14 EP claimed
US-20010053834-A1 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same JUNG MIN HO (KR) 2001-12-20 US claimed
US-6132926-A ArF photoresist copolymers HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-10-17 US claimed
US-6045967-A Method and device using ArF photoresist HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-04 US claimed
US-6028153-A Copolymer resin of maleimide and alicyclic olefin-based monomers, photoresist containing the copolymer resin and the preparation thereof HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-02-22 US claimed
EP-3440051-B1 NEUROPEPTIDE S RECEPTOR (NPSR) AGONISTS RES TRIANGLE INST (US) 2024-03-20 EP disclosed
CN-117417355-A Fused heterocyclic compound, preparation method and application thereof 上海翊石医药科技有限公司 2024-01-19 CN disclosed
CN-112771048-B Inhibitors of influenza virus replication and intermediates and uses thereof 南京药石科技股份有限公司 2022-08-19 CN disclosed
EP-3829719-A1 PYRROLO[2,3-B]PYRIDIN DERIVATIVES AS INHIBITORS OF INFLUENZA VIRUS REPLICATION Cocrystal Pharma, Inc. (US) 2021-06-09 EP disclosed
US-10858318-B2 Born-based cycloaddition catalysts and methods for the production of bio-based terephthalic acid, isophthalic acid and poly (ethylene terephthalate) BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY (US) 2020-12-08 US disclosed
WO-2020023813-A1 PYRROLO[2,3-B]PYRIDIN DERIVATIVES AS INHIBITORS OF INFLUENZA VIRUS REPLICATION COCRYSTAL PHARMA, INC. (US) 2020-01-30 WO disclosed
WO-2019060953-A1 CHIRAL AUXILIARIES AND USES THEREOF UNIVERSITY OF NEW ENGLAND (AU) 2019-04-04 WO disclosed
US-6312865-B1 Semiconductor device using polymer-containing photoresist, and process for manufacturing the same HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-11-06 US disclosed
US-6165672-A Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-12-26 US disclosed
US-6166082-A Substituted 5-biarylpentanoic acids and derivatives as matrix metalloprotease inhibitors BAYER CORPORATION (US) 2000-12-26 US disclosed
US-6132926-A ArF photoresist copolymers HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-10-17 US disclosed
US-6045967-A Method and device using ArF photoresist HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-04-04 US disclosed
US-6028153-A Copolymer resin of maleimide and alicyclic olefin-based monomers, photoresist containing the copolymer resin and the preparation thereof HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2000-02-22 US disclosed
EP-0790974-A1 SUBSTITUTED 4-BIARYLBUTYRIC OR 5-BIARYLPENTANOIC ACIDS AND DERIVATIVES AS MATRIX METALLOPROTEASE INHIBITIORS Bayer Corporation (US) 1997-08-27 EP disclosed
US-5110927-A Hypotensive agents THE UNITED STATES OF AMERICA AS REPRESENTED BY THE DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) 1992-05-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10858318-B2 Born-based cycloaddition catalysts and methods for the production of bio-based terephthalic acid, isophthalic acid and poly (ethylene terephthalate) ACSL4, EBPL, EML4 POLB 714/4885TDP1 1238/4885APEX1 1048/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.