Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.52 |
| ▸ | TSHR | P16473 | 4/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.52 |
| ▸ | CA2 | P00918 | 4/20 | 0.43 |
| ▸ | CA4 | P22748 | 4/20 | 0.43 |
| ▸ | HPGD | P15428 | 4/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.43 |
| ▸ | CA12 | O43570 | 3/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | CA3 | P07451 | 2/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | GMNN | O75496 | 1/20 | 0.43 |
| ▸ | EGFR | P00533 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | FYN | P06241 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30035564 | 1.00 | ALDH1A1 (0.52) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL31205557 | 0.95 | ALDH1A1 (0.52) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL384048 | 0.95 | ALDH1A1 (0.52) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL7161191 | 0.95 | ALDH1A1 (0.52) | ALDH1A1TSHRTDP1CA2CA4 | |
| Ammonia Solution, Strong SCHEMBL31387947 | 0.93 | ALDH1A1 (0.50) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL30717192 | 0.93 | ALDH1A1 (0.50) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL8524899 | 0.91 | ESR1 (0.52) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL28141477 | 0.88 | ALDH1A1 (0.47) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL6685287 | 0.87 | ESR1 (0.52) | ALDH1A1TSHRTDP1CA2CA4 | |
| SCHEMBL23861613 | 0.84 | TSHR (0.45) | ALDH1A1TSHRTDP1CA2CA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-5295089-A | — | — | None | — | — | JP | disclosed |
| CN-112218844-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-28 | — | — | US | disclosed |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-15 | — | — | US | disclosed |
| EP-3805191-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND RESIN PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-04-14 | — | — | EP | disclosed |
| CN-112218844-A | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2021-01-12 | — | — | CN | disclosed |
| EP-1832613-B9 | GRAFT COPOLYMER, METHOD FOR PRODUCING SAME AND RESIN COMPOSITION CONTAINING SUCH GRAFT COPOLYMER | KANEKA CORP (JP) | 2012-08-29 | — | — | EP | disclosed |
| EP-1832613-B1 | GRAFT COPOLYMER, METHOD FOR PRODUCING SAME AND RESIN COMPOSITION CONTAINING SUCH GRAFT COPOLYMER | KANEKA CORP (JP) | 2012-02-15 | — | — | EP | disclosed |
| EP-1746116-B1 | COPOLYMER, GRAFT COPOLYMER, GRAFT COPOLYMER PARTICLE, FLAME RETARDANT, AND RESIN COMPOSITION | KANEKA CORP (JP) | 2011-07-06 | — | — | EP | disclosed |
| EP-1964856-A1 | POLYMER PARTICLES, PROCESS FOR PRODUCTION THEREOF, RESIN COMPOSITIONS CONTAINING THE PARTICLES, AND MOLDINGS | Kaneka Corporation (JP) | 2008-09-03 | — | — | EP | disclosed |
| US-20080085975-A1 | Graft Copolymer, Method For Producing The Same And Resin Composition Containing The Graft Copolymer | KANEKA CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| US-20070219319-A1 | Copolymer, Graft Copolymer, Graft Copolymer Particles, Flame Retardant, and Resin Composition | KANEKA CORPORATION | 2007-09-20 | — | — | US | disclosed |
| EP-1832613-A1 | GRAFT COPOLYMER, METHOD FOR PRODUCING SAME AND RESIN COMPOSITION CONTAINING SUCH GRAFT COPOLYMER | Kaneka Corporation (JP) | 2007-09-12 | — | — | EP | disclosed |
| EP-1746116-A1 | COPOLYMER, GRAFT COPOLYMER, GRAFT COPOLYMER PARTICLE, FLAME RETARDANT, AND RESIN COMPOSITION | Kaneka Corporation (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-5660921-A | MULTILAYER PACKAGES; TOGETHER WITH POLYIMIDE AND COPPER LAYER | IBM CORPORATION (US) | 1997-08-26 | — | — | US | disclosed |
| US-5593720-A | Process for making a multileveled electronic package | IBM CORPORATION (US) | 1997-01-14 | — | — | US | disclosed |
| US-5516874-A | USED BETWEEN LAYERS IN ELECTRONIC PACKAGING WITH POLYIMIDES AND COPPER | IBM CORPORATION (US) | 1996-05-14 | — | — | US | disclosed |
| EP-0690498-A2 | Poly(arcyl ether benzimidazoles) and their use as capping layers in microelectronic structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-01-03 | — | — | EP | disclosed |
| JP-H05295089-A | CURABLE RESIN COMPOSITION | DAIHACHI CHEM IND CO LTD | 1993-11-09 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11747728-B2 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | RER1, FEM1B, UNC119 | ALDH1A1 3198/4885TSHR 3874/4885TDP1 4301/4885 |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | RER1, NBAS, INTS9 | ALDH1A1 1644/4885TSHR 2741/4885TDP1 4384/4885 |
| US-20210109448-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN | RER1, FEM1B, UNC119 | ALDH1A1 3198/4885TSHR 3874/4885TDP1 4301/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.