Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 5/20 | 0.56 |
| ▸ | CES1 | P23141 | 5/20 | 0.56 |
| ▸ | BCHE | P06276 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | ALB | P02768 | 1/20 | 0.42 |
| ▸ | KAT6A | Q92794 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | DCLK1 | O15075 | 1/20 | 0.35 |
| ▸ | DYRK3 | O43781 | 1/20 | 0.35 |
| ▸ | ROCK2 | O75116 | 1/20 | 0.35 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.35 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.35 |
| ▸ | ABL1 | P00519 | 1/20 | 0.35 |
| ▸ | EGFR | P00533 | 1/20 | 0.35 |
| ▸ | NTRK1 | P04629 | 1/20 | 0.35 |
| ▸ | LCK | P06239 | 1/20 | 0.35 |
| ▸ | FYN | P06241 | 1/20 | 0.35 |
| ▸ | CDK1 | P06493 | 1/20 | 0.35 |
| ▸ | CSF1R | P07333 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28557442 | 0.84 | CES2 (0.54) | CES2CES1BCHEHPGDALB | |
| SCHEMBL22540 | 0.84 | CES2 (0.58) | CES2CES1BCHEHPGDALB | |
| SCHEMBL580352 | 0.78 | CES2 (0.62) | CES2CES1BCHEHPGDALB | |
| SCHEMBL18130110 | 0.77 | CES2 (0.46) | CES2CES1BCHEHPGDALB | |
| SCHEMBL8383833 | 0.75 | CES2 (0.48) | CES2CES1BCHEHPGDALB | |
| O-Xylene SCHEMBL28242721 | 0.75 | CES2 (0.48) | CES2CES1BCHEHPGDALB | |
| SCHEMBL6441124 | 0.74 | CES2 (0.71) | CES2CES1BCHEHPGDALB | |
| SCHEMBL16953851 | 0.74 | CES2 (0.58) | CES2CES1BCHEHPGDALB | |
| SCHEMBL31537534 | 0.74 | CES2 (0.71) | CES2CES1BCHEHPGDALB | |
| SCHEMBL365453 | 0.74 | CES2 (0.71) | CES2CES1BCHEHPGDALB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9447220-B2 | Self-assembled structures, method of manufacture thereof and articles comprising the same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-20 | — | — | US | claimed |
| US-8822130-B2 | Self-assembled structures, method of manufacture thereof and articles comprising the same | THE TEXAS A&M UNIVERSITY SYSTEM (US) | 2014-09-02 | — | — | US | claimed |
| US-20140142252-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2014-05-22 | — | — | US | claimed |
| US-20140141376-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2014-05-22 | — | — | US | claimed |
| US-20140142249-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | THE TEXAS A&M UNIVERSITY SYSTEM | 2014-05-22 | — | — | US | claimed |
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | claimed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | claimed |
| US-9447220-B2 | Self-assembled structures, method of manufacture thereof and articles comprising the same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-09-20 | — | — | US | disclosed |
| US-9223214-B2 | Self-assembled structures, method of manufacture thereof and articles comprising the same | THE TEXAS A&M UNIVERSITY SYSTEM (US) | 2015-12-29 | — | — | US | disclosed |
| US-8822130-B2 | Self-assembled structures, method of manufacture thereof and articles comprising the same | THE TEXAS A&M UNIVERSITY SYSTEM (US) | 2014-09-02 | — | — | US | disclosed |
| US-20140141376-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2014-05-22 | — | — | US | disclosed |
| US-20140142249-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | THE TEXAS A&M UNIVERSITY SYSTEM | 2014-05-22 | — | — | US | disclosed |
| US-20140142252-A1 | SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2014-05-22 | — | — | US | disclosed |
| US-6919160-B2 | Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-07-19 | — | — | US | disclosed |
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | disclosed |
| US-20050037289-A1 | monomers that can be homopolymerized or copolymerized with other reactive components to make resins within sub-200 nanometer (nm) photoresist compositions | VERSUM MATERIALS US, LLC | 2005-02-17 | — | — | US | disclosed |
| EP-1505050-A1 | Bridged carbocyclic compounds and methods of making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-02-09 | — | — | EP | disclosed |
| US-20040175644-A1 | Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. | 2004-09-09 | — | — | US | disclosed |
| EP-1449839-A2 | Fluorinated acrylic compounds, methods for preparation of the compounds and photoresist compositions containing same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-08-25 | — | — | EP | disclosed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050037289-A1 | monomers that can be homopolymerized or copolymerized with other reactive components to make resins within sub-200 nanometer (nm) photoresist compositions | SUB1, CAD, PARP10 | CES2 341/4885CES1 2067/4885BCHE 3858/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.