SCHEMBL5847592

SCHEMBL5847592

COc1cc2c(c(S(=O)(=O)O)c1OC)C(=O)c1ccccc1C2=O

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 3/20 0.54
NPC1 O15118 2/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
MAPT P10636 6/20 0.52
ALDH1A1 P00352 4/20 0.52
THRB P10828 2/20 0.52
LCK P06239 1/20 0.52
GLA P06280 1/20 0.52
LIMK1 P53667 1/20 0.52
LIMK2 P53671 1/20 0.52
MEN1 O00255 5/20 0.50
KMT2A Q03164 5/20 0.50
KDM4E B2RXH2 1/20 0.50
USP2 O75604 1/20 0.50
DUSP3 P51452 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
CRHBP P24387 1/20 0.47
CRHR2 Q13324 1/20 0.47
PGAM1 P18669 3/20 0.46
POLB P06746 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL7190290 0.94 RAB9A (0.48) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL7190294 0.91 RAB9A (0.46) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL13517957 0.81 EPHX2 (0.43) MAPTALDH1A1MEN1KMT2AKDM4E
SCHEMBL23198991 0.81 EPHX2 (0.65) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL9822621 0.78 PGAM1 (0.43) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL18601894 0.78 RAB9A (0.62) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL13239418 0.77 MAPT (0.53) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL16226066 0.76 RAB9A (0.64) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL30020897 0.76 RAB9A (0.64) RAB9ANPC1SMN1; SMN2MAPTALDH1A1
SCHEMBL16225884 0.75 MAPT (0.72) RAB9ANPC1SMN1; SMN2MAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7141614-B2 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2006-11-28 US disclosed
US-20040265731-A1 Photosensitive resin composition and photosensitive films and laminates made by using the same KANEKA CORPORATION (JP) 2004-12-30 US disclosed