⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20656 | 0.67 | TSHR (0.43) | — | |
| SCHEMBL7177724 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL7549527 | 0.67 | TSHR (0.43) | — | |
| SCHEMBL11070461 | 0.67 | ALDH1A1 (0.35) | — | |
| SCHEMBL2540205 | 0.67 | ALDH1A1 (0.48) | — | |
| SCHEMBL2365396 | 0.67 | ALDH1A1 (0.31) | — | |
| SCHEMBL11879616 | 0.65 | — | — | |
| SCHEMBL278045 | 0.65 | — | — | |
| SCHEMBL3429854 | 0.64 | TSHR (0.40) | — | |
| Hydrochloric Acid SCHEMBL7717766 | 0.64 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2013177326-A1 | SILICON PRECURSORS FOR LOW TEMPERATURE ALD OF SILICON-BASED THIN-FILMS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-11-28 | — | — | WO | claimed |
| WO-2011124913-A1 | PROCESS FOR PREPARING A DEVICE | THE UNIVERSITY OF LIVERPOOL (GB) | 2011-10-13 | — | — | WO | claimed |
| US-20120091541-A1 | MIXED METAL OXIDES | THE UNIVERSITY OF LIVERPOOL (GB) | 2012-04-19 | — | — | US | disclosed |
| EP-2417062-A1 | MIXED METAL OXIDES | THE UNIVERSITY OF LIVERPOOL (GB) | 2012-02-15 | — | — | EP | disclosed |
| WO-2011124913-A1 | PROCESS FOR PREPARING A DEVICE | THE UNIVERSITY OF LIVERPOOL (GB) | 2011-10-13 | — | — | WO | disclosed |
| WO-2010116184-A1 | MIXED METAL OXIDES | ULIVE ENTERPRISES LIMITED (GB) | 2010-10-14 | — | — | WO | disclosed |