SCHEMBL2365396

SCHEMBL2365396

C=CCN(CC=C)[Sb](N(CC=C)CC=C)N(CC=C)CC=C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11070461 0.72 ALDH1A1 (0.35) ALDH1A1
SCHEMBL7177724 0.72 ALDH1A1 (0.35) ALDH1A1
Hydrochloric Acid SCHEMBL7717766 0.69 ALDH1A1 (0.33) ALDH1A1
Bromide SCHEMBL29011443 0.67 ALDH1A1 (0.32) ALDH1A1
SCHEMBL586091 0.67
SCHEMBL20656 0.65 TSHR (0.43) ALDH1A1
SCHEMBL7549527 0.65 TSHR (0.43) ALDH1A1
SCHEMBL2482957 0.64 ALDH1A1 (0.31) ALDH1A1
SCHEMBL8098659 0.64 ALDH1A1 (0.48) ALDH1A1
SCHEMBL7676459 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9219232-B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films ENTEGRIS, INC. (US) 2015-12-22 US claimed
US-20140220733-A1 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-08-07 US claimed
US-8709863-B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-04-29 US claimed
US-20130029456-A1 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-01-31 US claimed
US-8268665-B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-09-18 US claimed
US-20110263100-A1 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2011-10-27 US claimed
US-5124278-A Reactive deposition for semiconductors using metal organic amines as metallic donors AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-06-23 US claimed
US-9219232-B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films ENTEGRIS, INC. (US) 2015-12-22 US disclosed
US-20140220733-A1 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-08-07 US disclosed
US-8709863-B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2014-04-29 US disclosed
US-20130029456-A1 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-01-31 US disclosed
EP-2511280-A1 Germanium amidinate complexes useful for CVD/ALD of metal thin films ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-10-17 EP disclosed
US-8268665-B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-09-18 US disclosed
US-8008117-B2 Antimony and germanium complexes useful for CVD/ALD of metal thin films ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2011-08-30 US disclosed
US-20100317150-A1 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-12-16 US disclosed
US-7838329-B2 precursor mixture comprising germanium bis(n-butyl, N,N-diisopropylamidinate, and solvent; chemical vapor depositing a germanium-antimony-tellurium (GST) films; microelectronic devices; infrared detectors ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-11-23 US disclosed
US-20090305458-A1 precursor mixture comprising germanium bis(n-butyl, N,N-diisopropylamidinate, and solvent; chemical vapor depositing a germanium-antimony-tellurium (GST) films; microelectronic devices; infrared detectors ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2009-12-10 US disclosed
EP-2078102-A2 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS Advanced Technology Materials, Inc. (US) 2009-07-15 EP disclosed
WO-2008057616-A2 ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN FILMS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2008-05-15 WO disclosed
US-5124278-A Reactive deposition for semiconductors using metal organic amines as metallic donors AIR PRODUCTS AND CHEMICALS, INC. (US) 1992-06-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090305458-A1 precursor mixture comprising germanium bis(n-butyl, N,N-diisopropylamidinate, and solvent; chemical vapor depositing a germanium-antimony-tellurium (GST) films; microelectronic devices; infrared detectors GMNN, GSTM2, GSTM1 ALDH1A1 609/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.