Known targets — ChEMBL curated mechanism
ADRB1CDK4CDK6CHRM2CHRM3DPP4DRD2DRD3DRD4EGFRHRH1HTR1BHTR1DHTR1FHTR2AHTR2CHTR4SLC6A2SLC6A4
The experimentally established mechanism targets of Succinic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGLN1 | Q9GZT9 | 6/20 | 0.69 |
| ▸ | LMNA | P02545 | 4/20 | 0.69 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.69 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.69 |
| ▸ | PHF8 | Q9UPP1 | 7/20 | 0.60 |
| ▸ | KDM2A | Q9Y2K7 | 7/20 | 0.60 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.59 |
| ▸ | KDM5C | P41229 | 4/20 | 0.57 |
| ▸ | KDM6B | O15054 | 3/20 | 0.57 |
| ▸ | KDM7A | Q6ZMT4 | 1/20 | 0.57 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.53 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.53 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.53 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.53 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.53 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | SLC13A3 | Q8WWT9 | 1/20 | 0.50 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Succinic Acid SCHEMBL5875148 | 1.00 | EGLN1 (0.69) | EGLN1LMNAALKBH5SUCNR1PHF8 | |
| Succinic Acid SCHEMBL2138211 | 0.88 | — | — | |
| Succinic Acid SCHEMBL28135272 | 0.87 | LMNA (0.55) | EGLN1LMNAALKBH5SUCNR1PHF8 | |
| Succinic Acid SCHEMBL28177178 | 0.87 | LMNA (0.55) | EGLN1LMNAALKBH5SUCNR1PHF8 | |
| Adipic Acid SCHEMBL5874870 | 0.86 | LMNA (0.73) | LMNASLC22A6OR51E2TSHRNFKB1 | |
| Glutarate SCHEMBL5874412 | 0.86 | SLC22A6 (0.73) | LMNASLC22A6OR51E2TSHRNFKB1 | |
| Glutarate SCHEMBL5874406 | 0.86 | SLC22A6 (0.73) | LMNASLC22A6OR51E2TSHRNFKB1 | |
| Adipic Acid SCHEMBL5874879 | 0.86 | LMNA (0.73) | LMNASLC22A6OR51E2TSHRNFKB1 | |
| Succinic Acid SCHEMBL9150973 | 0.86 | EGLN1 (0.60) | EGLN1LMNAALKBH5SUCNR1PHF8 | |
| Levulinic Acid SCHEMBL29218348 | 0.85 | LMNA (0.78) | EGLN1LMNAALKBH5SUCNR1PHF8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106147673-A | Adhesive composition and surface protective film | 藤森工业株式会社 | 2016-11-23 | — | — | CN | claimed |
| CN-119462685-A | Arteannuin derivative and application thereof in treating cerebral apoplexy | 上海英诺富成生物科技有限公司 | 2025-02-18 | — | — | CN | disclosed |
| CN-110520452-A | (meth) acrylic copolymer, method for producing same, resin composition, and antifouling coating composition | MITSUBISHI CHEM CORP | 2019-11-29 | — | — | CN | disclosed |
| CN-110506064-A | (meth) acrylic copolymer, method for producing same, resin composition, and antifouling coating composition | MITSUBISHI CHEM CORP | 2019-11-26 | — | — | CN | disclosed |
| CN-110383162-A | The production method of electrochromic display device and electrochromic display device | 株式会社理光 | 2019-10-25 | — | — | CN | disclosed |
| CN-106444280-B | Negative-type photosensitive resin composition | 东友精细化工有限公司 | 2019-10-11 | — | — | CN | disclosed |
| CN-110023443-A | resin composition for adhesive and adhesive sheet | 三菱化学株式会社 | 2019-07-16 | — | — | CN | disclosed |
| CN-110023442-A | Resin composition for adhesive and adhesive sheet | 三菱化学株式会社 | 2019-07-16 | — | — | CN | disclosed |
| CN-107075049-B | Actinic energy ray curable resion composition, its manufacturing method, coating, film and laminate film | DIC株式会社 | 2019-07-12 | — | — | CN | disclosed |
| CN-105723256-B | Method for producing laminated optical film | 住友化学株式会社 | 2019-06-25 | — | — | CN | disclosed |
| CN-105900262-A | Structure for nonaqueous electrolyte secondary batteries, nonaqueous electrolyte secondary battery, and method for producing said structure | 株式会社吴羽 | 2016-08-24 | — | — | CN | disclosed |
| CN-105842988-A | Photosensitive resin comopsition, photocurable pattern formed from the same and image display comprising the photocurable pattern | 东友精细化工有限公司 | 2016-08-10 | — | — | CN | disclosed |
| CN-105842987-A | Photosensitive resin comopsition photocurable pattern formed from the same and image display comprising the pattern | 东友精细化工有限公司 | 2016-08-10 | — | — | CN | disclosed |
| CN-105792807-A | Photocrosslinkable nail varnish composition as base coat and method of application | 莱雅公司 | 2016-07-20 | — | — | CN | disclosed |
| CN-101264414-B | Green high-efficiency recyclable SO2 gas absorbent and preparation thereof | UNIV HEFEI TECHNOLOGY | 2010-10-06 | — | — | CN | disclosed |
| CN-101264414-A | Green high-efficiency recyclable SO2 gas absorbent and preparation thereof | UNIV HEFEI TECHNOLOGY (CN) | 2008-09-17 | — | — | CN | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-5412126-A | Reaction with alkylamine to form salt, separation, decomposition | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1995-05-02 | — | — | US | disclosed |
| US-5132456-A | Sorption of carboxylic acid from carboxylic salt solutions at PHS close to or above the pKa of the acid, with regeneration with an aqueous solution of ammonia or low-molecular-weight alkylamine | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1992-07-21 | — | — | US | disclosed |