Diethylamine

Diethylamine

SCHEMBL5874415

CCNCC.O=S(=O)(O)c1ccccc1

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

BTKCACNA1CCACNA1DCACNA1FCACNA1SCACNA2D1CACNA2D2DRD2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQHRH1HTR2AP2RY12

The experimentally established mechanism targets of Diethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.67
TSHR P16473 3/20 0.67
PSIP1 O75475 1/20 0.50
LMNA P02545 3/20 0.47
KDM4E B2RXH2 2/20 0.47
HSD17B10 Q99714 2/20 0.47
HPGD P15428 1/20 0.47
HIF1A Q16665 1/20 0.47
POLB P06746 1/20 0.47
CYP2D6 P10635 1/20 0.47
HSD11B1 P28845 1/20 0.44
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
MMP1 P03956 1/20 0.43
MMP2 P08253 1/20 0.43
MMP9 P14780 1/20 0.43
MMP8 P22894 1/20 0.43
MMP13 P45452 1/20 0.43
ALDH1A1 P00352 3/20 0.42
PKM P14618 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Diethylamine SCHEMBL27879398 0.89 SMN1; SMN2 (0.53) SMN1; SMN2TSHRPSIP1LMNAKDM4E
Propane SCHEMBL28882618 0.87 TSHR (0.80) SMN1; SMN2TSHRPSIP1LMNAKDM4E
SCHEMBL6736149 0.85 SMN1; SMN2 (0.70) SMN1; SMN2TSHRPSIP1LMNAKDM4E
SCHEMBL3719208 0.85 TSHR (0.76) SMN1; SMN2TSHRPSIP1LMNAKDM4E
Butane SCHEMBL2906063 0.85 TSHR (0.76) SMN1; SMN2TSHRPSIP1LMNAKDM4E
Alcohol SCHEMBL281881 0.85 TSHR (0.76) SMN1; SMN2TSHRPSIP1LMNAKDM4E
SCHEMBL27464245 0.85 TSHR (0.76) SMN1; SMN2TSHRPSIP1LMNAKDM4E
SCHEMBL2638204 0.84 TSHR (0.84) SMN1; SMN2TSHRPSIP1LMNAKDM4E
SCHEMBL6904987 0.84 SMN1; SMN2 (0.61) SMN1; SMN2TSHRPSIP1LMNAKDM4E
SCHEMBL29118883 0.83 TSHR (0.73) SMN1; SMN2TSHRPSIP1LMNAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119430811-A Reinforced modified granite powder-based road base material and preparation method thereof 中冶武汉冶金建筑研究院有限公司 2025-02-14 CN claimed
CN-119430811-A Reinforced modified granite powder-based road base material and preparation method thereof 中冶武汉冶金建筑研究院有限公司 2025-02-14 CN disclosed
CN-112513016-B Sulfur-containing polymerizable monomer and use thereof 尚美德齿科材料有限公司 2023-12-19 CN disclosed
CN-112940432-B Polymerizable monomer for dental material, composition, adhesive dental material, and kit 三井化学株式会社 2022-12-30 CN disclosed
CN-107427414-B Polymerizable monomer for dental material, composition, adhesive dental material, and kit 三井化学株式会社 2021-07-02 CN disclosed
CN-112940432-A Polymerizable monomer for dental material, composition, adhesive dental material, and kit 三井化学株式会社 2021-06-11 CN disclosed
CN-112513016-A Sulfur-containing polymerizable monomer and use thereof 尚美德齿科材料有限公司 2021-03-16 CN disclosed
CN-106535815-B Reactive micro-applicator with metal-containing additives for applying dental adhesives 古莎有限公司 2020-05-29 CN disclosed
CN-101752098-B Method of manufacturing solid electrolytic capacitor SANYO ELECTRIC CO 2012-11-14 CN disclosed
CN-101752098-A Method of manufacturing solid electrolytic capacitor SANYO ELECTRIC CO 2010-06-23 CN disclosed
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
EP-0736574-B1 Thermoplastic resin composition comprising carbonate and acrylic resin GEN ELECTRIC (US) 2004-06-02 EP disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed
US-6103827-A A TRANSPARENT THERMOPLASTIC RESIN BLENDS GENERAL ELECTRIC COMPANY (US) 2000-08-15 US disclosed
US-5883194-A RADIATION TRANSPARENT THERMOPLASTIC RESINS OF CARBONATE AND ESTER BLENDS WITH ACRYLATE RESINS AND CATALYSTS GENERAL ELECTRIC COMPANY (US) 1999-03-16 US disclosed
CN-1141935-A Thermoplastic resin composition GEN ELECTRICS CORP (US) 1997-02-05 CN disclosed
EP-0736574-A2 Thermoplastic resin composition comprising carbonate and acrylic resin GENERAL ELECTRIC COMPANY (US) 1996-10-09 EP disclosed