Trichloroacetic Acid

Trichloroacetic Acid

SCHEMBL5874544

Cc1ccccc1C(C)(C)N.O=C(O)C(Cl)(Cl)Cl

nearest known ligand 0.39

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.39
GAA P10253 2/20 0.39
NPSR1 Q6W5P4 2/20 0.39
MEN1 O00255 1/20 0.39
CYP2C19 P33261 1/20 0.39
CYP1A2 P05177 3/20 0.38
CYP2D6 P10635 2/20 0.37
HPGD P15428 1/20 0.37
GABRA1 P14867 1/20 0.36
GABRB2 P47870 1/20 0.36
MAPT P10636 1/20 0.36
MYC P01106 1/20 0.36
ALDH1A1 P00352 2/20 0.36
TP53 P04637 1/20 0.36
TSHR P16473 1/20 0.36
CASR P41180 1/20 0.36
KDM4E B2RXH2 1/20 0.35
ATM Q13315 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL5874331 0.89 KMT2A (0.41) KMT2AGAANPSR1MEN1CYP2C19
Oxalic Acid SCHEMBL153610 0.87 ALDH1A1 (0.44) KMT2AGAANPSR1CYP2C19CYP1A2
Acetic Acid SCHEMBL1047016 0.87 HPGD (0.40) KMT2AGAANPSR1MEN1CYP2C19
Oxalic Acid SCHEMBL5179301 0.87 ALDH1A1 (0.44) KMT2AGAANPSR1CYP2C19CYP1A2
Trifluoroacetic Acid SCHEMBL5874682 0.86 KDM4E (0.41) KMT2AGAANPSR1CYP2C19CYP1A2
Dichloroacetic Acid SCHEMBL5874130 0.84 KMT2A (0.38) KMT2AGAANPSR1MEN1CYP2C19
Chloroacetic Acid SCHEMBL5874302 0.84 HIF1A (0.38) KMT2AGAANPSR1MEN1CYP2C19
SCHEMBL10909489 0.83 KCNN4 (0.42) KMT2ACYP2C19CYP1A2CYP2D6HPGD
Methyl Alcohol SCHEMBL6949733 0.82 GABRA1 (0.45) KMT2AGAANPSR1MEN1GABRA1
SCHEMBL29581427 0.82 TSHR (0.45) CYP1A2GABRA1GABRB2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed