Trifluoroacetic Acid

Trifluoroacetic Acid

SCHEMBL5874682

Cc1ccccc1C(C)(C)N.O=C(O)C(F)(F)F

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.41
ALDH1A1 P00352 1/20 0.41
GAA P10253 1/20 0.41
ATM Q13315 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CYP2C19 P33261 1/20 0.39
CHIT1 Q13231 1/20 0.39
CES1 P23141 1/20 0.38
PDK1 Q15118 1/20 0.38
PDK2 Q15119 1/20 0.38
PDK3 Q15120 1/20 0.38
PDK4 Q16654 1/20 0.38
CYP1A2 P05177 1/20 0.37
CYP2D6 P10635 1/20 0.37
HDAC6 Q9UBN7 4/20 0.37
HPGD P15428 1/20 0.37
HDAC3 O15379 2/20 0.36
HDAC4 P56524 2/20 0.36
HDAC1 Q13547 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL5874331 0.89 KMT2A (0.41) KDM4EALDH1A1GAAATMNPSR1
Acetic Acid SCHEMBL1047016 0.87 HPGD (0.40) KDM4EALDH1A1GAAATMNPSR1
Oxalic Acid SCHEMBL5179301 0.87 ALDH1A1 (0.44) KDM4EALDH1A1GAAATMNPSR1
Oxalic Acid SCHEMBL153610 0.87 ALDH1A1 (0.44) KDM4EALDH1A1GAAATMNPSR1
Trichloroacetic Acid SCHEMBL5874544 0.86 KMT2A (0.39) KDM4EALDH1A1GAAATMNPSR1
SCHEMBL31387889 0.84 ALDH1A1 (0.47) KDM4EALDH1A1GAAATMNPSR1
SCHEMBL10909489 0.83 KCNN4 (0.42) CYP2C19CYP1A2CYP2D6HDAC6HPGD
Methyl Alcohol SCHEMBL6949733 0.82 GABRA1 (0.45) ALDH1A1GAAATMNPSR1TDP1
SCHEMBL29581427 0.82 TSHR (0.45) ALDH1A1ATMTDP1CYP1A2GABRA1
SCHEMBL164361 0.82 TSHR (0.45) ALDH1A1ATMTDP1CYP1A2GABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7128976-B2 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2006-10-31 US disclosed
US-20030091838-A1 Composition for film formation, method of film formation, and silica-based film JSR CORPORATION (JP) 2003-05-15 US disclosed