Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 1/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 7/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2831497 | 0.89 | AKR1C3 (0.47) | AKR1C3KDM4EAPEX1HTT | |
| SCHEMBL3808317 | 0.85 | AKR1C3 (0.44) | AKR1C3KDM4EAPEX1HTT | |
| Methacrylic Acid SCHEMBL1562495 | 0.84 | AKR1C3 (0.43) | AKR1C3KDM4EAPEX1HTT | |
| Styrene SCHEMBL4051043 | 0.82 | AKR1C3 (0.53) | AKR1C3KDM4EAPEX1HTT | |
| SCHEMBL2451012 | 0.77 | ALDH1A1 (0.40) | AKR1C3KDM4EAPEX1 | |
| SCHEMBL14993955 | 0.76 | AKR1C3 (0.43) | AKR1C3KDM4EAPEX1HTT | |
| Styrene SCHEMBL726846 | 0.75 | AKR1C3 (0.50) | AKR1C3PTGS1APEX1HTT | |
| SCHEMBL28588058 | 0.74 | AKR1C3 (0.57) | AKR1C3KDM4EAPEX1HTT | |
| SCHEMBL14040079 | 0.74 | AKR1C3 (0.57) | AKR1C3KDM4EAPEX1HTT | |
| Methacrylic Acid SCHEMBL28827024 | 0.74 | KDM4E (0.36) | AKR1C3KDM4EHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1634120-B1 | HIGHLY REFLECTIVE SUBSTRATES FOR THE DIGITAL PROCESSING OF PHOTOPOLYMER PRINTING PLATES | NAPP SYSTEMS INC (US) | 2016-03-09 | — | — | EP | disclosed |
| EP-2560047-A1 | Highly reflective substrates for the digital processing of photopolymer printing plates | NAPP SYSTEMS, INC. (US) | 2013-02-20 | — | — | EP | disclosed |
| CN-1806205-B | Highly reflective substrates for digital processing of photopolymer printing plates | NAPP SYSTEMS INC | 2012-11-07 | — | — | CN | disclosed |
| US-7083896-B2 | Highly reflective substrates for the digital processing of photopolymer printing plates | NAPP SYSTEMS, INC. (US) | 2006-08-01 | — | — | US | disclosed |
| CN-1806205-A | Highly reflective substrates for digital processing of photopolymer printing plates | NAPP SYSTEMS INC (US) | 2006-07-19 | — | — | CN | disclosed |
| US-20060057499-A1 | Highly reflective substrates for the digital processing of photopolymer printing plates | NAPP SYSTEMS, INC. | 2006-03-16 | — | — | US | disclosed |
| EP-1634120-A1 | HIGHLY REFLECTIVESUBSTRATES FOR THE DIGITAL PROCESSING OF PHOTOPOLYMER PRINTING PLATES | Napp Systems, Inc. (US) | 2006-03-15 | — | — | EP | disclosed |
| US-7005232-B2 | Highly reflective substrates for the digital processing of photopolymer printing plates | NAPP SYSTEMS, INC. (US) | 2006-02-28 | — | — | US | disclosed |
| WO-2005001567-A1 | HIGHLY REFLECTIVESUBSTRATES FOR THE DIGITAL PROCESSING OF PHOTOPOLYMER PRINTING PLATES | NAPP SYSTEMS, INC. (US) | 2005-01-06 | — | — | WO | disclosed |
| US-20040250720-A1 | Highly reflective substrates for the digital processing of photopolymer printing plates | CITIBANK, N.A. | 2004-12-16 | — | — | US | disclosed |