SCHEMBL5898601

SCHEMBL5898601

CCCC(=O)NCCC[Si](OCC)(OCC)OCC

nearest known ligand 0.56

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CASP2 P42575 1/20 0.56
NAAA Q02083 1/20 0.44
FAAH O00519 3/20 0.42
TSHR P16473 1/20 0.42
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
DNM1 Q05193 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25768098 0.91 FAAH (0.47) CASP2NAAAFAAHTSHRMEN1
SCHEMBL28414246 0.90 FAAH (0.56) CASP2NAAAFAAHDNM1
SCHEMBL28213111 0.89 CASP2 (0.50) CASP2NAAAFAAH
SCHEMBL22028652 0.88 FAAH (0.58) CASP2NAAAFAAHDNM1
SCHEMBL29105419 0.88 FAAH (0.58) CASP2NAAAFAAHDNM1
SCHEMBL28260456 0.88 FAAH (0.58) CASP2NAAAFAAHDNM1
SCHEMBL775223 0.88 FAAH (0.58) CASP2NAAAFAAHDNM1
SCHEMBL11571311 0.88 NAAA (0.56) CASP2NAAAFAAHTSHRMEN1
SCHEMBL27783491 0.88 CASP2 (0.50) CASP2NAAAFAAHTSHRDNM1
SCHEMBL7122081 0.87 MEN1 (0.45) CASP2NAAAFAAHTSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060004121-A1 Polymer-brush modified fillers for composites REGENTS OF THE UNIVERSITY OF COLORADO, THE 2006-01-05 US claimed
CN-107966879-B Composition for forming silicon-containing extreme ultraviolet resist underlayer film containing additive 日产化学工业株式会社 2021-06-01 CN disclosed
CN-104246614-B Composition for forming silicon-containing extreme ultraviolet resist underlayer film containing additive 日产化学工业株式会社 2020-09-08 CN disclosed
US-9627217-B2 Silicon-containing EUV resist underlayer film-forming composition including additive NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-04-18 US disclosed
US-9627217-B2 Silicon-containing EUV resist underlayer film-forming composition including additive NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-04-18 US disclosed
US-20150079792-A1 SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ADDITIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-03-19 US disclosed
US-20150079792-A1 SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ADDITIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-03-19 US disclosed
US-7442755-B2 Polymers for preventing or reducing aluminosilicate scale in a bayer process CYTEC TECHNOLOGY CORP. (US) 2008-10-28 US disclosed