Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | BCHE | P06276 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9550116 | 0.93 | ALDH1A1 (0.44) | ALDH1A1MAPTHTTPAX8TDP1 | |
| SCHEMBL9550112 | 0.91 | ALDH1A1 (0.43) | ALDH1A1MAPTHTTPAX8TDP1 | |
| SCHEMBL9550095 | 0.91 | KMT2A (0.44) | ALDH1A1MAPTHTTPAX8TDP1 | |
| SCHEMBL9550105 | 0.90 | ALDH1A1 (0.44) | ALDH1A1MAPTHTTPAX8TDP1 | |
| SCHEMBL952171 | 0.88 | KMT2A (0.49) | ALDH1A1MAPTHTTPAX8TDP1 | |
| SCHEMBL7788635 | 0.87 | ALDH1A1 (0.40) | ALDH1A1MAPTHTTPAX8TDP1 | |
| SCHEMBL9550122 | 0.87 | ALDH1A1 (0.46) | ALDH1A1MAPTHTTPAX8TDP1 | |
| SCHEMBL7602645 | 0.87 | PRMT5 (0.43) | ALDH1A1HTTKMT2AMEN1CYP1A2 | |
| SCHEMBL7604077 | 0.86 | SMN1; SMN2 (0.47) | MAPTKMT2ASMN1; SMN2POLBMCOLN3 | |
| SCHEMBL59186 | 0.84 | ALDH1A1 (0.49) | ALDH1A1MAPTHTTPAX8KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2777 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| US-10720259-B2 | Electroconductive film and method for manufacturing electroconductive pattern | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2020-07-21 | — | — | US | claimed |
| EP-1547678-B1 | Process for high-yield synthesis of nucleic acid arrays | AFFYMETRIX INC (US) | 2016-07-13 | — | — | EP | claimed |
| US-20050164258-A1 | Process for high-yield synthesis of standard length and long-mer nucleic acid arrays | AFFYMETRIX, INC. (US) | 2005-07-28 | — | — | US | claimed |
| EP-1547678-A2 | Process for high-yield synthesis of nucleic acid arrays | Affymetrix, Inc. (a Delaware Corporation) (US) | 2005-06-29 | — | — | EP | claimed |
| US-20040253547-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | claimed |
| US-6673525-B1 | COATING PHOTORESIST LAYERS ON SUBSTRATES, THEN BAKING, HYDROSILYLATING AND ETCHING WITH OXYGEN TO FORM MINIATURE INTEGRATED CIRCUIT PATTERNS | EUV LLC | 2004-01-06 | — | — | US | claimed |
| WO-2001063359-A2 | THIN LAYER IMAGING PROCESS FOR MICROLITHOGRAPHY USING RADIATION AT STRONGLY ATTENUATED WAVELENGTHS | EUV LIMITED LIABILITY CORPORATION (US) | 2001-08-30 | — | — | WO | claimed |
| US-6274286-B1 | Resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-14 | — | — | US | claimed |
| WO-2001029837-A1 | MEDIUM FOR FLUORESCENT READ-ONLY MULTILAYER OPTICAL INFORMATION CARRIER AND ITS MANUFACTURING METHOD | TRID STORE IP, LLC (US) | 2001-04-26 | — | — | WO | claimed |
| WO-1999052018-A1 | THIN LAYER IMAGING PROCESS FOR MICROLITHOGRAPHY USING RADIATION AT STRONGLY ATTENUATED WAVELENGTHS | EUV LIMITED LIABILITY CORPORATION (US) | 1999-10-14 | — | — | WO | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |
| US-5275921-A | Forming a thin film from a base polymer obtained from polyvinylphenol and having a protective tert-butoxy group | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-01-04 | — | — | US | claimed |