Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.49 |
| ▸ | HTT | P42858 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | MAOB | P27338 | 1/20 | 0.45 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.45 |
| ▸ | ACHE | P22303 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28856088 | 0.92 | ALDH1A1 (0.44) | ALDH1A1HTTMAPTTSHRMAOB | |
| SCHEMBL30355298 | 0.91 | ALDH1A1 (0.43) | ALDH1A1HTTMAPTTSHRMAOB | |
| SCHEMBL244116 | 0.90 | ALDH1A1 (0.49) | ALDH1A1HTTTSHRMAOBCA12 | |
| SCHEMBL498498 | 0.88 | TSHR (0.45) | ALDH1A1HTTMAPTTSHRPAX8 | |
| SCHEMBL32679667 | 0.87 | ALDH1A1 (0.48) | ALDH1A1HTTMAPTTSHRPAX8 | |
| SCHEMBL6105419 | 0.87 | ALDH1A1 (0.48) | ALDH1A1HTTMAPTTSHRPAX8 | |
| SCHEMBL5527025 | 0.86 | MMP1 (0.53) | ALDH1A1HTTMAPTTSHRMAOB | |
| SCHEMBL8061919 | 0.85 | VDR (0.47) | ALDH1A1HTTACHECA12CA9 | |
| SCHEMBL556153 | 0.84 | ACHE (0.46) | TSHRACHEMEN1RAB9AKMT2A | |
| SCHEMBL27966350 | 0.84 | MAPT (0.48) | ALDH1A1HTTMAPTPAX8ACHE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4117 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| US-12535736-B2 | Anti-reflective hard mask composition | CHEMPOLE CO., LTD. (KR) | 2026-01-27 | — | — | US | claimed |
| US-20250334883-A1 | RESIST UNDERLAYER COMPOSITIONS, AND METHODS OF FORMING PATTERNS USING THE COMPOSITIONS | SAMSUNG SDI CO LTD (KR) | 2025-10-30 | — | — | US | claimed |
| CN-119735984-B | Antireflective composition, antireflective film, patterning process, patterned substrate, semiconductor device, and method for manufacturing the same | 珠海基石科技有限公司 | 2025-05-23 | — | — | CN | claimed |
| CN-119735984-A | Antireflective composition, antireflective film, patterning process, patterned substrate, semiconductor device, and method for manufacturing the same | 珠海基石科技有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-119620541-A | Preparation and application of bottom anti-reflection coating with high etching rate | 儒芯微电子材料（上海）有限公司 | 2025-03-14 | — | — | CN | claimed |
| WO-2024205936-A1 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | INPRIA CORPORATION (US) | 2024-10-03 | — | — | WO | claimed |
| US-20240319599-A1 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | JSR CORPORATION (JP) | 2024-09-26 | — | — | US | claimed |
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| US-20020160318-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| US-6461717-B1 | Aperture fill | SHIPLEY COMPANY, L.L.C. | 2002-10-08 | — | — | US | claimed |
| US-6277750-B1 | MIXTURE OF POLYVINYL BUTYRAL COPOLYMER DYE AND SOLVENT; FOR PHOTOLITHOGRAPHY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2001-08-21 | — | — | US | claimed |
| WO-2001029837-A1 | MEDIUM FOR FLUORESCENT READ-ONLY MULTILAYER OPTICAL INFORMATION CARRIER AND ITS MANUFACTURING METHOD | TRID STORE IP, LLC (US) | 2001-04-26 | — | — | WO | claimed |
| EP-1046958-A1 | COMPOSITION FOR BOTTOM REFLECTION PREVENTIVE FILM AND NOVEL POLYMERIC DYE FOR USE IN THE SAME | Clariant International Ltd. (CH) | 2000-10-25 | — | — | EP | claimed |
| EP-0762207-B1 | Positive working photosensitive composition and method of producing relief structures | BASF AG (DE) | 2000-04-12 | — | — | EP | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |
| US-5783354-A | QUATERNARY AMMONIUM COMPOUNDS | BASF AKTIENGESELLSCHAFT (DE) | 1998-07-21 | — | — | US | claimed |
| US-5169741-A | Exposure to light of about 248.4 nm; activation of the photosensitizer by acid; high transparency; fine patterns; semiconductors | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1992-12-08 | — | — | US | claimed |
| EP-0425142-A2 | Positive acting photoresist and method of producing same | ROHM AND HAAS COMPANY (US) | 1991-05-02 | — | — | EP | claimed |