SCHEMBL7604077

SCHEMBL7604077

COc1ccc(S(=O)(=O)OCc2c([N+](=O)[O-])cccc2[N+](=O)[O-])cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.47
NPC1 O15118 3/20 0.47
KMT2A Q03164 3/20 0.47
RAB9A P51151 2/20 0.47
MMP1 P03956 3/20 0.43
MMP9 P14780 3/20 0.43
MMP13 P45452 3/20 0.43
MMP2 P08253 2/20 0.43
MMP8 P22894 2/20 0.43
CA2 P00918 1/20 0.43
CYP19A1 P11511 1/20 0.43
LMNA P02545 2/20 0.42
MAPT P10636 2/20 0.42
GAA P10253 1/20 0.42
PKM P14618 3/20 0.42
HPGD P15428 1/20 0.41
POLB P06746 1/20 0.41
MCOLN3 Q8TDD5 1/20 0.41
MEN1 O00255 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7597216 0.88 KMT2A (0.44) SMN1; SMN2NPC1KMT2ARAB9AMMP1
SCHEMBL59130 0.86 ALDH1A1 (0.47) SMN1; SMN2KMT2ARAB9AMAPTPOLB
SCHEMBL952171 0.85 KMT2A (0.49) SMN1; SMN2NPC1KMT2ARAB9ALMNA
SCHEMBL5527025 0.85 MMP1 (0.53) SMN1; SMN2NPC1KMT2ARAB9AMMP1
SCHEMBL7602645 0.84 PRMT5 (0.43) KMT2AMMP1MMP9MMP13MMP2
SCHEMBL8818910 0.80 ALDH1A1 (0.45) SMN1; SMN2NPC1KMT2ARAB9ACA2
SCHEMBL3253710 0.80 PTGS2 (0.42) SMN1; SMN2NPC1KMT2ARAB9ACYP19A1
SCHEMBL9550116 0.80 ALDH1A1 (0.44) SMN1; SMN2KMT2ARAB9AMAPTPOLB
SCHEMBL2574007 0.78 NPC1 (0.40) SMN1; SMN2NPC1KMT2ARAB9ACA2
SCHEMBL9550112 0.77 ALDH1A1 (0.43) SMN1; SMN2KMT2ARAB9AMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6492075-B1 COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST ADVANCED MICRO DEVICES, INC. 2002-12-10 US disclosed
US-6274289-B1 Chemical resist thickness reduction process ADVANCED MICRO DEVICES, INC. 2001-08-14 US disclosed
EP-0848288-A1 Resist materials LUCENT TECHNOLOGIES INC. (US) 1998-06-17 EP disclosed
US-4996136-A Radiation sensitive materials and devices made therewith AT&T BELL LABORATORIES (US) 1991-02-26 US disclosed