Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | LPL | P06858 | 1/20 | 0.48 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.48 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.48 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.48 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.48 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.48 |
| ▸ | ACHE | P22303 | 7/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | RELA | Q04206 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 4/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.32 |
| ▸ | AGXT | P21549 | 1/20 | 0.32 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15744762 | 0.88 | CA2 (0.38) | CA2LPLLIPGORAI1ORAI2 | |
| SCHEMBL18125392 | 0.80 | CA1 (0.35) | CA2CA1ENPP2 | |
| SCHEMBL18124820 | 0.80 | CA1 (0.35) | CA2CA1ENPP2 | |
| SCHEMBL14983340 | 0.76 | ENPP2 (0.46) | CA2ORAI1ORAI2ORAI3TRPV6 | |
| SCHEMBL14983372 | 0.76 | TDP1 (0.46) | ACHETDP1ALDH1A1TSHRCYP3A4 | |
| SCHEMBL14983341 | 0.76 | ORAI1 (0.46) | CA2ORAI1ORAI2ORAI3TRPV6 | |
| SCHEMBL14983349 | 0.76 | CA1 (0.46) | CA2TDP1ALDH1A1CA1TSHR | |
| SCHEMBL13308147 | 0.76 | CA1 (0.58) | CA2ACHETDP1ALDH1A1CA1 | |
| SCHEMBL309077 | 0.74 | CA4 (0.48) | CA2ORAI1ORAI2ORAI3TRPV6 | |
| SCHEMBL14282970 | 0.74 | CA2 (0.56) | CA2LPLLIPGORAI1ORAI2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20230127914-A1 | RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-7038070-B2 | Preparation of preparing substituted indanones | BASELL POLYOLEFINE GMBH (DE) | 2006-05-02 | — | — | US | disclosed |
| US-6963017-B2 | Preparation of preparing substituted indanones | BASELL POLYOLEFINE GMBH (DE) | 2005-11-08 | — | — | US | disclosed |
| EP-0968158-B1 | METHOD OF PREPARING SUBSTITUTED INDANONES, THE SUBSTITUTED INDANONES AND METALLOCENES PREPARED THEREFROM | BASELL POLYOLEFINE GMBH (DE) | 2005-08-10 | — | — | EP | disclosed |
| US-20050033076-A1 | Preparation of preparing substituted indanones | EQUISTAR CHEMICALS, LP | 2005-02-10 | — | — | US | disclosed |
| EP-1137641-B1 | PROCESS FOR PREPARING PYRIDAZIN-3-ON DERIVATIVES | SUMITOMO CHEMICAL CO (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20030009046-A1 | Preparation of preparing substituted indanones | EQUISTAR CHEMICALS, LP | 2003-01-09 | — | — | US | disclosed |
| US-6500951-B1 | RING CLOSING A CARBOXYLIC ACID DERIVATIVE IN PRESENCE OF A NITROGEN CONTAINING AROMATIC COMPOUND AND A BORON COMPOUND; HIGH YIELD AND PURITY | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-12-31 | — | — | US | disclosed |
| EP-1137641-A1 | PROCESS FOR PREPARING PYRIDAZIN-3-ON DERIVATIVES | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2001-10-04 | — | — | EP | disclosed |
| WO-2000034249-A1 | PROCESS FOR PREPARING PYRIDAZIN-3-ON DERIVATIVES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-06-15 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050033076-A1 | Preparation of preparing substituted indanones | CYP1A2, CYP2J2, IDH3A | CA2 4329/4885LPL 4804/4885LIPG 4401/4885 |
| US-20030009046-A1 | Preparation of preparing substituted indanones | CYP1A2, CYP1B1, CYP1A1 | CA2 4267/4885LPL 4825/4885LIPG 4535/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.