⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31135452 | 0.79 | LMNA (0.30) | — | |
| SCHEMBL28738694 | 0.77 | — | — | |
| SCHEMBL600973 | 0.76 | LMNA (0.32) | — | |
| SCHEMBL31135447 | 0.70 | LMNA (0.32) | — | |
| SCHEMBL108892 | 0.67 | — | — | |
| SCHEMBL6374192 | 0.67 | — | — | |
| SCHEMBL3315438 | 0.67 | — | — | |
| SCHEMBL28794337 | 0.66 | TSHR (0.38) | — | |
| SCHEMBL8772 | 0.66 | MAPK1 (0.42) | — | |
| SCHEMBL12060642 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105829999-B | Optical sheet, conductive sheet, and display device provided with same | 王子控股株式会社 | 2019-02-15 | — | — | CN | disclosed |
| CN-103890700-B | The display device of capacitor formula touch panel, capacitive touch panels | 王子控股株式会社 | 2018-10-12 | — | — | CN | disclosed |
| CN-106170522-A | Double-sided adhesive sheet and optical member | 王子控股株式会社 | 2016-11-30 | — | — | CN | disclosed |
| CN-102754055-B | Conductive laminate and use its touch panel | 王子制纸株式会社 | 2016-08-10 | — | — | CN | disclosed |
| CN-105829999-A | Optical sheet, conductive sheet, and display device provided with same | 王子控股株式会社 | 2016-08-03 | — | — | CN | disclosed |
| US-20150137331-A1 | POLYMERIC MATERIALS IN SELF-ASSEMBLED ARRAYS AND SEMICONDUCTOR STRUCTURES AND METHODS COMPRISING SUCH POLYMERIC MATERIALS | MICRON TECHNOLOGY INC (US) | 2015-05-21 | — | — | US | disclosed |
| US-8993088-B2 | Polymeric materials in self-assembled arrays and semiconductor structures comprising polymeric materials | MICRON TECHNOLOGY, INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-8945700-B2 | — | — | 2015-02-03 | — | — | US | disclosed |
| US-20140284306-A1 | METHOD FOR MANUFACTURING POROUS STRUCTURE AND METHOD FOR FORMING PATTERN | KABUSHIKI KAISHA TOSHIBA (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8778201-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2014-07-15 | — | — | US | disclosed |
| WO-2009134635-A2 | GRAPHOEPITAXIAL SELF-ASSEMBLY OF ARRAYS OF DOWNWARD FACING HALF-CYLINDERS | MICRON TECHNOLOGY, INC. (US) | 2009-11-05 | — | — | WO | disclosed |
| US-20090274887-A1 | Graphoepitaxial Self-Assembly of Arrays of Downward Facing Half-Cylinders | MICRON SEMICONDUCTOR PRODUCTS, INC. | 2009-11-05 | — | — | US | disclosed |
| US-20090130380-A1 | METHOD FOR MANUFACTURING POUROUS STRUCTURE AND METHOD FOR FORMING PATTERN | ASAKAWA KOJI | 2009-05-21 | — | — | US | disclosed |
| US-7517466-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-04-14 | — | — | US | disclosed |
| US-20060231525-A1 | Forming microphase-separated structure in film of graft or block copolymer with a chain of polyacrylonitrile, polycyclohexadiene derivative, polybutadiene, polysilane, polysiloxane, polyamic acid or polyaniline and thermally decomposable polymer chain; heating to decompose the decomposable phase; etching | ASAKAWA KOJI | 2006-10-19 | — | — | US | disclosed |
| US-7097781-B2 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-08-29 | — | — | US | disclosed |
| US-7090784-B2 | Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2006-08-15 | — | — | US | disclosed |
| US-20040050816-A1 | Forming pattern using graft polymer containing metal particles; overcoating substrates; removal polymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-03-18 | — | — | US | disclosed |
| US-20030222048-A1 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-04 | — | — | US | disclosed |
| US-6565763-B1 | Method for manufacturing porous structure and method for forming pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-05-20 | — | — | US | disclosed |