SCHEMBL5970075

SCHEMBL5970075

O=C1CC(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(=O)N1

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MAP3K14 Q99558 1/20 0.34
CA2 P00918 4/20 0.33
CA1 P00915 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5855515 0.82 MAP3K14 (0.39) MAP3K14
SCHEMBL3381432 0.76 MAP3K14 (0.35) MAP3K14
SCHEMBL193688 0.70 MAP3K14 (0.39) MAP3K14
SCHEMBL1028530 0.70 MAP3K14 (0.39) MAP3K14
SCHEMBL3985955 0.69 NPC1 (0.32)
SCHEMBL22654707 0.68 CA2 (0.34) CA2CA1
SCHEMBL22654705 0.68 CA2 (0.34) CA2CA1
SCHEMBL22654703 0.68 CA2 (0.34) CA2CA1
SCHEMBL114367 0.67 NPC1 (0.36) MAP3K14
SCHEMBL30569073 0.67 CRBN (0.47)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1641849-A1 PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS Symyx Technologies, Inc. (US) 2006-04-05 EP disclosed
EP-1641848-A1 PHOTORESIST POLYMER COMPOSITIONS JSR Corporation (JP) 2006-04-05 EP disclosed
WO-2005003198-A1 PHOTORESIST POLYMER COMPOSITIONS JSR CORPORATION (JP) 2005-01-13 WO disclosed
WO-2005000923-A1 PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS SYMYX TECHNOLOGIES, INC. (US) 2005-01-06 WO disclosed