Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.43 |
| ▸ | SETDB1 | Q15047 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.41 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3871451 | 0.89 | TSHR (0.50) | ALDH1A1KDM4EKMT2AHTTMAPT | |
| Acrylamide SCHEMBL16874400 | 0.88 | ALDH1A1 (0.39) | ALDH1A1KDM4ENPC1RAB9AHPGD | |
| SCHEMBL8477018 | 0.85 | HPGD (0.61) | ALDH1A1KDM4ENPC1RAB9AHPGD | |
| SCHEMBL6565730 | 0.85 | KMT2A (0.56) | MTNR1AKMT2AMAPTMEN1 | |
| SCHEMBL183463 | 0.82 | ALDH1A1 (0.59) | ALDH1A1KDM4EHPGDSMN1; SMN2KMT2A | |
| SCHEMBL9183720 | 0.81 | CA12 (0.45) | ALDH1A1KDM4ENPC1RAB9AHPGD | |
| Methacrylic Acid SCHEMBL28898117 | 0.79 | ALDH1A1 (0.56) | ALDH1A1HPGDSMN1; SMN2KMT2AGAA | |
| SCHEMBL731190 | 0.79 | KMT2A (0.50) | ALDH1A1NPC1RAB9ASMN1; SMN2KMT2A | |
| SCHEMBL27623642 | 0.79 | MAPT (0.40) | ALDH1A1KDM4ERAB9AHPGDSMN1; SMN2 | |
| SCHEMBL14204990 | 0.79 | SETDB1 (0.59) | ALDH1A1NPC1RAB9AHPGDSETDB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1073 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040063034-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-04-01 | — | — | US | claimed |
| EP-1403041-A2 | Infrared-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-31 | — | — | EP | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| EP-0399755-B1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | FUJI PHOTO FILM CO LTD (JP) | 1994-03-30 | — | — | EP | claimed |
| US-5250385-A | Photosensitivity, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | claimed |
| US-5112743-A | Aromatic-aldehyde diazo resins | FUJI PHOTO FILM CO., LTD. (JP) | 1992-05-12 | — | — | US | claimed |
| EP-0399755-A1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | Fuji Photo Film Co., Ltd. (JP) | 1990-11-28 | — | — | EP | claimed |
| WO-2023032868-A1 | ON-MACHINE DEVELOPMENT-TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR MANUFACTURING PRINTING PLATE | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| CN-109952536-B | Radiation-sensitive composition, lithographic printing plate precursor, and method for making lithographic printing plate | 富士胶片株式会社 | 2022-07-08 | — | — | CN | disclosed |
| WO-2022138880-A1 | LAMINATE OF NEGATIVE LITHOGRAPHIC PRINTING PLATE ORIGINAL PLATE AND METHOD FOR MANUFACTURING NEGATIVE LITHOGRAPHIC PRINTING PLATE | 富士フイルム株式会社 | 2022-06-30 | — | — | WO | disclosed |
| CN-108700836-B | Method for manufacturing laminate and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-06-28 | — | — | CN | disclosed |
| EP-2572243-B1 | POLYMERIZABLE COMPOSITION | FUJIFILM CORP (JP) | 2021-04-07 | — | — | EP | disclosed |
| CN-107709407-B | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, semiconductor device, and method for producing polyimide precursor composition | 富士胶片株式会社 | 2020-11-17 | — | — | CN | disclosed |
| US-4555474-A | IMPROVED PHOTOSENSITIVITY USING HETEROCYCLIC KETONE PHOTOINITIATORS; LITHOGRAPHY; PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1985-11-26 | — | — | US | disclosed |
| EP-0006125-B1 | PHOTOPOLYMERISABLE MIXTURE AND LIGHT-SENSITIVE COATING MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-05-11 | — | — | EP | disclosed |
| EP-0006124-B1 | PHOTOPOLYMERISABLE MIXTURE AND LIGHT-SENSITIVE COATING MATERIAL | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-12-22 | — | — | EP | disclosed |
| US-4248958-A | HIGH LIGHT SENSITIVITY AND GOOD FLEXIBILITY | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-03 | — | — | US | disclosed |
| US-4245030-A | Photopolymerizable mixture containing improved plasticizer | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-01-13 | — | — | US | disclosed |
| EP-0006125-A1 | Photopolymerisable mixture and light-sensitive coating material | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |
| EP-0006124-A1 | Photopolymerisable mixture and light-sensitive coating material | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |