Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS3 | P29474 | 1/20 | 0.36 |
| ▸ | NOS1 | P29475 | 1/20 | 0.36 |
| ▸ | NOS2 | P35228 | 1/20 | 0.36 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 3/20 | 0.35 |
| ▸ | XPO1 | O14980 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.33 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | SLC22A12 | Q96S37 | 2/20 | 0.33 |
| ▸ | SLC2A9 | Q9NRM0 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | HPGD | P15428 | 2/20 | 0.33 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29466950 | 1.00 | NOS3 (0.36) | NOS3NOS1NOS2AKR1C3HTT | |
| SCHEMBL3871452 | 0.89 | AKR1B1 (0.44) | AKR1C3HTTSMN1; SMN2MAPTLMNA | |
| SCHEMBL8600665 | 0.85 | MTNR1A (0.48) | HTTMTNR1ALMNAHPGDPARP10 | |
| SCHEMBL554390 | 0.82 | ALDH1A1 (0.42) | NOS3NOS1NOS2AKR1C3SMN1; SMN2 | |
| SCHEMBL554389 | 0.82 | ALDH1A1 (0.42) | NOS3NOS1NOS2AKR1C3SMN1; SMN2 | |
| SCHEMBL4079712 | 0.79 | CYP1A2 (0.40) | HTTSMN1; SMN2MAPTMTNR1AALDH1A1 | |
| SCHEMBL4080178 | 0.74 | KMT2A (0.48) | HTTXPO1MAPTMTNR1AMTNR1B | |
| SCHEMBL11393609 | 0.74 | AKR1C3 (0.43) | AKR1C3MAPTSLC22A12SLC2A9ALDH1A1 | |
| SCHEMBL11393614 | 0.74 | AKR1C3 (0.43) | AKR1C3MAPTSLC22A12SLC2A9ALDH1A1 | |
| SCHEMBL4078029 | 0.74 | HTR2A (0.44) | MAPTLMNAALDH1A1HPGDCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040063034-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-04-01 | — | — | US | claimed |
| EP-1403041-A2 | Infrared-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-31 | — | — | EP | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| EP-0399755-B1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | FUJI PHOTO FILM CO LTD (JP) | 1994-03-30 | — | — | EP | claimed |
| US-5250385-A | Photosensitivity, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-05 | — | — | US | claimed |
| US-5112743-A | Aromatic-aldehyde diazo resins | FUJI PHOTO FILM CO., LTD. (JP) | 1992-05-12 | — | — | US | claimed |
| EP-0399755-A1 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | Fuji Photo Film Co., Ltd. (JP) | 1990-11-28 | — | — | EP | claimed |
| WO-2023032868-A1 | ON-MACHINE DEVELOPMENT-TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR MANUFACTURING PRINTING PLATE | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| CN-109952536-B | Radiation-sensitive composition, lithographic printing plate precursor, and method for making lithographic printing plate | 富士胶片株式会社 | 2022-07-08 | — | — | CN | disclosed |
| WO-2022138880-A1 | LAMINATE OF NEGATIVE LITHOGRAPHIC PRINTING PLATE ORIGINAL PLATE AND METHOD FOR MANUFACTURING NEGATIVE LITHOGRAPHIC PRINTING PLATE | 富士フイルム株式会社 | 2022-06-30 | — | — | WO | disclosed |
| CN-108700836-B | Method for manufacturing laminate and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-06-28 | — | — | CN | disclosed |
| EP-2572243-B1 | POLYMERIZABLE COMPOSITION | FUJIFILM CORP (JP) | 2021-04-07 | — | — | EP | disclosed |
| CN-107709407-B | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, semiconductor device, and method for producing polyimide precursor composition | 富士胶片株式会社 | 2020-11-17 | — | — | CN | disclosed |
| US-4810618-A | HIGH SENSITIVITY, PRINTING PLATES, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1989-03-07 | — | — | US | disclosed |
| US-4772534-A | PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1988-09-20 | — | — | US | disclosed |
| US-4737484-A | Heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1988-04-12 | — | — | US | disclosed |
| US-4636459-A | PHOTOINITIATOR AND UNSATURATED MONOMER; PRINTING PLATES | FUJI PHOTO FILM CO., LTD. (JP) | 1987-01-13 | — | — | US | disclosed |
| US-4555474-A | IMPROVED PHOTOSENSITIVITY USING HETEROCYCLIC KETONE PHOTOINITIATORS; LITHOGRAPHY; PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 1985-11-26 | — | — | US | disclosed |
| US-4248958-A | HIGH LIGHT SENSITIVITY AND GOOD FLEXIBILITY | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-03 | — | — | US | disclosed |
| US-4245030-A | Photopolymerizable mixture containing improved plasticizer | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-01-13 | — | — | US | disclosed |